氢氟酸溶液常用于硅酸盐玻璃的表面处理,其化学反应机理一直备受关注.本文从氢氟酸电离反应出发,全面归纳氢氟酸稀溶液电离机理、平衡常数以及各电离产物的作用,重点总结了HF-SiO2反应动力学、各研究理论模型、反应速率公式和反应机理.针对目前硅酸盐玻璃的化学处理研究现状,认为硅酸盐玻璃在高浓度氢氟酸溶液和氢氟酸/强酸混合溶液中化学处理的应用将是未来的研究方向.
参考文献
| [1] | 张骋,叶影秦,李强.硼硅酸锌玻璃的制备及其发光特性[J].硅酸盐通报,2009(02):346-349. |
| [2] | 李磊,安二峰,杨军.典型建筑玻璃力学性能的SHPB实验[J].硅酸盐通报,2010(02):390-394. |
| [3] | 田英良,张磊,戴琳,程金树.TFT-LCD基板玻璃化学组成的发展状况与展望[J].硅酸盐通报,2010(06):1348-1352,1362. |
| [4] | Ray N H;Stacey M H .Increasing the strength of glass by etching and ion-exchange[J].Journal of Materials Science,1969,4:73-79. |
| [5] | Spierings G A C M .Wet chemical etching of silicate glasses in hydrofluoric acid based solutions[J].Journal of Materials Science,1993,28:6261-6273. |
| [6] | Spierings G A C M .Compositional effects in the dissolution of multicomponent silicate glasses in aqueous HF solutions[J].Journal of Materials Science,1991,26:3329-3336. |
| [7] | Pugacz-Muraszkiewicz I J;Hammond B R .Application of silicates to the detection of flaws in glassy passivation films deposited on silicon substrates[J].Journal of Vacuum Science and Technology A:Vacuum Surfaces and Films,1977,14:1964-1982. |
| [8] | Prokopowicz-Prigogine M .Reactivity of a silica network of glass:molecular mechanism of the dissolution of a silica network in aqueous HF-HC1 solutions[J].Glastechnische Berichte,1989,62:249-255. |
| [9] | Bell R P;Bascombe K N;McCoubrev J C.Kinetics of the depolymerization of trioxane in aqueous acids,and the acidic properties of aqueous hydrogen fluoride[J].Journal of the Chemical Society,1956:1286-1291. |
| [10] | Spierings G A C M;Van D I J K J .The dissolution of Na2 O-MgO-CaO-SiO2 glass in aqueous HF solutions[J].Journal of Materials Science,1987,22:1869-1874. |
| [11] | Monk D J;Soane D S .A review of the chemical reaction mechanism and kinetics for hydrofluoric acid etching of silicon dioxide for surface micromachining applications[J].THIN SOLID FILMS,1993,232:1-12. |
| [12] | Judge J S .A study of the dissolution of SiO2 in acidic fluoride solutions[J].Journal of glectrochem Soc,1971,118:1772-1775. |
| [13] | Warren L J .The measurement of pH in acid fluoride solutions and evidence for the existence of (HF) 2[J].Analytica Chimica Acta,1971,53:199-202. |
| [14] | Verhaverbeke S;Teerlinck I;Vinckier C et al.Theetching mechanism of SiO2 in hydrofluoric acid[J].Journal of the Electrochemical Society,1994,141(10):2852-2857. |
| [15] | Mesmer R E;Baes Jr.C F .Fluoride complexes of beryllium(Ⅱ) in aqueous media[J].Inorganic Chemistry,1969,8(03):618-626. |
| [16] | Broene H H;De Vries T .The thermodynamics of aqueous hydrofluoric acid solutions[J].Journal of the American Chemical Society,1947,69:1644-1646. |
| [17] | IUPAC.Stability constants of metal-ion complexes,part A:inorganic ligands (IUPAC chemical data series)[M].Pergamon Press.,Oxford,1982:188. |
| [18] | Mctigue P;O Donnel T A;Verity B .The determination of fluoride-ion activities in moderately concentrated aqueous hydrogen-cluoride[J].Australian Journal of Chemistry,1985,38(12):1797-1807. |
| [19] | Farrer H N;Rossotti F J C .Proton-fluoride association in sodium perchlorate media[J].Journal of Inorganic and Nuclear Chemistry,1964,26(11):1959-1965. |
| [20] | Fogler H S;Lund K .Aeidization Ⅲ-the kinetics of the dissolution of sodium and potassium feldspar in HF/HC1 acid mixtures[J].Chemical Engineering Science,1975,30:1325-1332. |
| [21] | Kline W E;Fogler H S .Dissolution kinetics:catalysis by strong acids[J].Journal of Colloid and Interface Science,1981,82(01):93-102. |
| [22] | Palmer W G.The action of aqueous hydrofluoric acid on silica[J].Journal of the Chemical Society,1930:1656-1664. |
| [23] | Blumberg A A;Stavimou S C .Tabulated functions for heterogeneous reaction rates:the attack of vitreous silica by hydrofluoric acid[J].Journal of Physical Chemistry,1960,64(10):1438-1442. |
| [24] | Blumberg A A .Differential thermal analysis and heterogeneous kinetics:the rcaction of vitreous silica with hydrofluoric acid[J].Journal of Physical Chemistry,1959,63(07):1129-1132. |
| [25] | 苏英,周永恒,黄武,顾真安.石英玻璃与HF酸反应动力学的研究[J].硅酸盐学报,2004(03):287-293. |
| [26] | Knotter DM. .Etching mechanism of vitreous silicon dioxide in HF-based solutions[J].Journal of the American Chemical Society,2000(18):4345-4351. |
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