通过对溅射过程中辉光放电现象及薄膜沉积速率的研究,发现随着氮浓度的增大,靶面上形成一层不稳定的AlN层,由于AlN的溅射速率远小于Al,从而使薄膜的沉积速率显著下降.同时还研究了其它溅射参数对薄膜沉积速率的影响.结果表明:随靶基距的增大和靶功率的减小,不同程度引起沉积速率的下降;随着溅射气压的增大,最初沉积速率不断增大,当溅射气压增大到一定程度时,沉积速率达到最大值,之后随溅射气压的增大,又不断减小.
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