采用沉淀法合成F-,Sr2+单掺杂和共掺杂的氧化铈,探讨了不同掺杂离子对氧化铈紫外屏蔽性能和氧化催化性能的影响.XRD结果表明,F-,Sr2+单掺杂或共掺杂的CeO2均为立方萤石结构,但衍射峰因掺杂离子的不同而稍有偏移.UV-Vis光谱表明,F-,Sr2+单掺杂和共掺杂的氧化铈的紫外屏蔽性能均优于纯氧化铈.共掺杂氟锶后的氧化铈的氧化催化性明显比纯氧化铈的弱,但是,单掺杂氟离子或锶离子的氧化铈的氧化催化性比纯氧化铈的强.
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