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以2D C/SiC复合材料为基底,采用聚合物裂解工艺(Polymer plyen)制备了含硼硅玻璃SiC自愈合涂层.利用扫描电镜对含硼硅玻璃SiC涂层的2D C/SiC复合材料氧化前后的微结构形貌进行了分析.研究了含硼硅玻璃SiC涂层的C/SiC复合材料在静态空气中700℃、1000℃和1200℃下的氧化行为,并分析了涂层层数对C/SiC复合材料氧化行为的影响.结果表明:含硼硅玻璃SiC涂层在该温度下形成的玻璃相可以较好地封填表面缺陷(裂纹和孔洞);并且随温度升高及涂层层数增加,试样在氧化过程中质量减少率降低,氧化后的强度保持率提高.

参考文献

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