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采用传统固相烧结工艺,制备了掺杂量分别为0.00~1.00、0.00~0.06的La、V掺杂SrBi4Ti4O15铁电陶瓷.X射线衍射结果显示,La、V对SrBi4Ti4O15的A、B位掺杂都未影响材料的晶体结构.A、B位掺杂均改善了材料的铁电性能.La掺杂量为0.25时,SBTi的剩余极化(2Pr)增大50%,同时矫顽场(2Ec)下降了25%.少量的V取代SBTi的B位Ti离子后,2Ec虽无明显变化,但2Pr却可增大近两倍,并且不影响材料的居里温度,而A位掺杂导致了材料的居里温度的明显下降.这与A、B位掺杂对材料晶格畸变程度的影响有关.

参考文献

[1] Uchida H;Yoshikawa H;Okada I et al.[J].Applied Physics Letters,2002,81:2229.
[2] Irie H;Miyayama M;Kudo T .[J].Journal of Applied Physics,2001,90:4089.
[3] Park B H;Kang B S;Bu S D et al.[J].Nature,1999,401:683.
[4] A-Paz de Araujo C;Cuchiaro J D;McMillan L D et al.[J].NATURE,1995,374:627.
[5] Chon U;Kim K B;Jang H M et al.[J].Applied Physics Letters,2001,79:3137.
[6] Noguchi Y;Miyayama M .[J].Applied Physics Letters,2001,78:1903.
[7] Uchida H;Yoshikawa H;Okada I et al.[J].Japanese Journal of Applied Physics,2002,41:6820.
[8] Noguchi Y;Miwa I;Goshima Y et al.[J].Japanese Journal of Applied Physics,2000,39:L1259.
[9] Watanabe T;Funakubo H;Osada M et al.[J].Applied Physics Letters,2002,80:100.
[10] Bao Z H;Yao Y Y;Zhu J S et al.[J].Materials Letters,2002,56:861.
[11] Lrie H;Miyayama .[J].Applied Physics Letters,2001,79:251.
[12] Zhang S T;Yang B;Chen Y F et al.[J].Journal of Applied Physics,2002,91:3160.
[13] Sohn D S;Xianyu W X;Lee W I et al.[J].Applied Physics Letters,2001,79:3672.
[14] Shannon R D .[J].Acta Crystallographica,1976,A32:751.
[15] Park B H;Hyun S J;Bu D S et al.[J].Applied Physics Letters,1999,74:1907.
[16] Kang B S;Park B H;Su S D et al.[J].Applied Physics Letters,1999,75:2644.
[17] Friessnegg T;Aggarwal S;Ramesh R et al.[J].Applied Physics Letters,2000,77:127.
[18] Baudry L .[J].Journal of Applied Physics,1999,86:1096.
[19] 卢网平,朱骏,惠荣,陆文峰,陈小兵.La掺杂对Sr2Bi4Ti5O18铁电陶瓷性能的影响[J].功能材料,2003(05):562-563,566.
[20] Shimakawaa Y;Kubo Y;Tauchi Y et al.[J].Applied Physics Letters,2001,79:2791.
[21] Shimakawa Y;Kubo Y;Tauchi Y et al.[J].Applied Physics Letters,2001,79:2791.
[22] Osada M.;Kakihana M.;Watanabe T.;Funakubo M.;Tada M. .Cation distribution and structural instability in Bi4-xLaxTi3O12[J].Japanese journal of applied physics,2001(9B):5572-5575.
[23] Noguchi Y;Miyayama M;Kudo T .[J].Physical Review B,2001,63:214102.
[24] Takenaka T;Sakata K .[J].Ferroelectrics,1981,38:769.
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