欢迎登录材料期刊网

材料期刊网

高级检索

对铟锡氧化物ITO(Indium Tin Oxide)纳米粉末的制备方法如均相共沉淀法,水溶液共沉淀法,电解法,溶胶-凝胶法,喷雾燃烧法,喷雾热分解法等以及ITO磁控溅射靶的现有几种制备工艺进行了综合评述.阐述了各种制备工艺过程和工作原理,比较和分析了各工艺方法的优缺点,并提出了制备高品质ITO粉末及ITO靶的努力方向.

参考文献

[1] Kentaro Utsumi;Osamu Matsunatga;Tsutomu Takahata .Low resistivity ITO film prepared using the ultra high density ITO target[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,1998(1/2):30-34.
[2] Kentaro Utsumi;Toshiya Takahar .[P].United States Patent.6003620,2000.
[3] Nicolas Nadaud;Monique Nanot;Philippe Boch .[J].Journal of the American Ceramic Society,1994,77:843-846.
[4] Gehman B L;Jonsson S;Rudolph T;Scherer M,Weigert M,Werner R .[J].Thin Solid Films,1992,220:333-336.
[5] Swati Ray;Ratnabali Banerjee;Basu N;Batabyal A K,Barua A K .[J].Journal of Applied Physics,1983,54(06):3497-3501.
[6] Buchanan M;Webb J B;Williams D F .[J].Applied Physics Letters,1980,37(02):213-215.
[7] Osamu Matsunaga et al.[P].United States Patent.5700419,1997.
[8] Toru Saito;Yoshikazu Kumahara .[P].United States Patent.6106681,2000.
[9] [P].United States Patent 5433901,1995 or WO18138,1994.
[10] Bong-Chull Kim;Joon-Hyung Lee;Jeong-Joo Kim;Takayasu Ikegami .[J].Materials Letters,2002,52:114-119.
[11] 张立德;牟季美.纳米材料和纳米结构[M].北京:科学出版社,2001:173.
[12] Mouri Takashi;Ogawa Nobuhiro;Tokuyama-shi Yamaguchiken et al.[P].European Patent Application.0584672,1993.
[13] Hendrinus Adrianus Van Straten .[P].UK Patatent Application GB 2236309,1991.
[14] 段学臣,陈振华,周立,胡林轩.超细氧化铟-氧化锡 (ITO) 复合粉末的研制与结构特性[J].稀有金属,1998(05):396.
[15] 于汉芹.ITO超细粉末的研制[J].有色矿冶,2000(01):35-38.
[16] 李光风;刘东平;邓培;沈樱涛 .[J].稀有金属与硬质合金,1999,138:15-17.
[17] Yanagisawa K;Udawatte C P;Nasu N .[J].Journal of Materials Research,2000,15(06):1404-1408.
[18] Koichi Nakashima;Toru Saito;Takamasa Maekawa .[P].United States Patent 5417816,1995.
[19] Motoyuki Toki;Mamoru Aizawa .[J].Journal of Sol-Gel Science and Technology,1997,8:717-720.
[20] Douglas M Mattox .[J].THIN SOLID FILMS,1991,204:25-32.
[21] 姚敏琪,卫英慧,胡兰青,许并社.溶胶-凝胶法制备纳米粉体[J].稀有金属材料与工程,2002(05):325-329.
[22] 陈世柱,尹志民,黄伯云,胡林轩.用喷雾燃烧法制备工TO纳米级粉末的研究[J].有色金属,2000(02):88-90.
[23] Iwamoto Tetsushi;Ogawa Nobuhiro .[P].European Patent Application.0386932,1990.
[24] Nam J G;Choi H .[J].Scripta Materialia,2001,44:2047-2050.
[25] L Lambert Bates;Curtis W Griffin;Davd D Marchant;John E Garnier .[J].American Ceramic Society Bulletin,1986,65(04):673-678.
[26] Nadaud N;Lequeux N;Nanot M;Jove J, Roisnel T .[J].Journal of Solid State Chemistry,1998,135:140-148.
[27] Paul Lippen;Ludo Froyen;Louis Buekenhout .[P].United States Patent 6123787 or WO97/08358,2000.
[28] Chandana P. Udawatte;Kazumichi Yanagisawa .Fabrication of Low-Porosity Indium Tin Oxide Ceramics in Air from Hydrothermally Prepared Powder[J].Journal of the American Ceramic Society,2001(1):251-253.
[29] Osmu Matsunaga;Yuichi Nagasaki;Tsutomu Takahata .[P].United States Patent.5980815,1999.
[30] Koichiro Iwasa;Tetsuhiko Isobe;Mamoru Senna.[J].Solid State Ionics,1997:71-78.
[31] Koichi Nakajima;Noriaki Sato et al.[P].United States Patent 5094787,1992.
[32] Homan Michael et al.[P].China Patent1128690,1996.
[33] David Francis Lupton;Jorg Schielke et al.[P].United States Patent.6030507,2000.
[34] Udawatte C P;Yanagisawa K .[J].Journal of Solid State Chemistry,2000,154:444-450.
[35] Enoki H;Echigoya J;Suto H .[J].Journal of Materials Science,1991,26:4110-4115.
[36] Muraoka M.;Sawada Y.;Matsushita J.;Suzuki M. .Sintering of tin-doped indium oxide (Indium-Tin-Oxide, ITO) with Bi2O3 additive[J].Journal of Materials Science,1998(23):5621-5624.
[37] 白川彰彦;伊泽广纯;野田孝男 .[P].China Patent.1119851,1996.
上一张 下一张
上一张 下一张
计量
  • 下载量()
  • 访问量()
文章评分
  • 您的评分:
  • 1
    0%
  • 2
    0%
  • 3
    0%
  • 4
    0%
  • 5
    0%