采用射频反应磁控溅射法在玻璃衬底上成功制备出纳米ZnO镶嵌SiO2非晶薄膜,利用X射线衍射仪、场发射扫描电子显微镜、X射线光电子能谱仪和紫外-可见分光光度计研究了纳米Zn0镶嵌SiO2薄膜相比纯ZnO纳米薄膜结构的变化及镶嵌结构对其光学特性的影响.研究发现与纯ZnO纳米薄膜相比,纳米ZnO镶嵌SiO2薄膜结构样品呈非晶结构,在紫外区光吸收系数以及光学带隙明显增大,光吸收以及光学带隙的变化与样品制备的衬底温度有关.研究结果表明,由于SiO2的特殊结构实现了对纳米ZnO的束缚,减少了ZnO纳米粒子的集聚,使得量子限制效应变得显著,导致复合膜光学带隙的明显增大以及吸收边的蓝移.
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