电场环境对磁控溅射纯Cr薄膜沉积过程的影响

功能材料, 2010, 41(11): 2006-2013.

电场环境对磁控溅射纯Cr薄膜沉积过程的影响

李洪涛 ^1, , 蒋百灵 ^2, , 杨波 ^3, , 付杨洪 ^4,

1.西安理工大学,材料学院,陕西,西安,710048

2.西安理工大学,材料学院,陕西,西安,710048

3.西安理工大学,材料学院,陕西,西安,710048

4.西安理工大学,材料学院,陕西,西安,710048

基金项目: 西安理工大学优秀博士学位论文研究基金资助项目(101-210905) 国家高技术研究发展计划(863计划)资助项目(2005AA33H010)

关键词：电场环境 , 磁控溅射 , 纯Cr薄膜 , 微观结构

Effect of electric field environment on the process of depositing pure Cr films by magnetron sputtering

基于磁控溅射离子镀技术,以纯Cr薄膜为研究对象,分析了电场环境对纯Cr薄膜微观组织结构的影响规律;结合溅射沉积和薄膜生长原理揭示了电场环境对纯Cr薄膜沉积过程的内在机理;探讨了磁控溅射离子镀技术在工程材料的纳米化和非晶化进程中应有的功能,以期为纳米材料的研发及其制备技术的创新提供参考依据.

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材料期刊网

电场环境对磁控溅射纯Cr薄膜沉积过程的影响

Effect of electric field environment on the process of depositing pure Cr films by magnetron sputtering

参考文献