用直流等离子体增强化学气相沉积(PCVD)方法获得了硬质薄膜;考察了Al含量及高温退火对薄膜微观结构转变过程及其硬度的影响. 结果表明,制备的薄膜由3---10 nm晶粒组成. 随Al含量增加, 薄膜硬度升高, x超过0.83时, 硬度开始急剧下降; 结构分析证实x小于0.83, 薄膜是固溶强化; x=0.83, 薄膜中出现六方氮化铝相(h--AlN). 热稳定性实验表明,薄膜 的纳米结构和硬度在N2环境下可以维持到900℃.
Ti1-xAlxN hard coatings have been synthesized by direct current (dc) plasma--enhanced chemical vapor deposition (PCVD). Dependences of aluminum content and annealing at elevated temperatures on the microstructure and hardness of Ti1-xAlxN coatings were investigated. The results show that plastic hardness measured by means of indentation test increases with x$increasing up to 0.83 and then decreases. XRD measurements indicate that the coatings with x<0.83 are fcc. solid solution with 3--10 nm grain scale. When x=0.83, relatively soft h--AlN phase is precipitated in Ti1-xAlxN coating, while the coating hardness begins a dramatical decrease. Furthermore, the nano--crystalline structure and high hardness of the coating can keep up to 900℃, which indicates the synthesized coating having good thermal stability.
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