欢迎登录材料期刊网

材料期刊网

高级检索

Sn量子点可用于制作单电子器件、高密度存储单元、红外探测器以及发射器等,具有重要的研究意义.介绍了离子注入、分子束外延、磁控溅射和固相外延等各种制备Sn量子点的生长技术,综述了Sn量子点的光学性质、电学性质以及理论计算研究结果,指出了Sn量子点研究面临的关键问题以及研究方向.

参考文献

[1] Reed M A;Randall J N;Aggarwal R J et al.Observation of discrete electronic states in a zero-dimensional semiconductor nanostructure[J].Physical Review Letters,1988,60(06):535.
[2] 赵凤瑷,张春玲,王占国.半导体量子点及其应用(Ⅰ)[J].物理,2004(04):249-256.
[3] 杜磊;庄奕琪.纳米电子学[M].北京:电子工业出版社,2004:406.
[4] 赵凤瑷,张春玲,王占国.半导体量子点及其应用(Ⅱ)[J].物理,2004(05):327-334.
[5] Wang K L;Dong H C;Liu J L et al.Ge/Si self-assembled quantum dots and their optoelectronic device applications[J].Proceedings of the IEEE,2007,95(09):1866.
[6] Nakajima, A;Futatsugi, T;Horiguchi, N;Yokoyama, N .Formation of Sn nanocrystals in thin SiO2 film using low-energy ion implantation[J].Applied Physics Letters,1997(25):3652-3654.
[7] Nakajima A.;Nakao H.;Usuki T.;Horiguchi N.;Yokoyama N.;Futatsugi T. .Microstructure and electrical properties of Sn nanocrystals in thin, thermally grown SiO2 layers formed via low energy ion implantation[J].Journal of Applied Physics,1998(3):1316-1320.
[8] A. Karim;G.V. Hansson;W.-X. Ni;P.O. Holtz;M. Larsson;H.A. Atwater .Photoluminescence studies of Sn quantum dots in Si grown by MBE[J].Optical materials,2005(5):836-840.
[9] Pairot Moontragoon;Nenad Vukmirovic;Zoran Ikonic;Paul Harrison .Electronic structure and optical properties of Sn and SnGe quantum dots[J].Journal of Applied Physics,2008(10):103712-1-103712-8-0.
[10] J. M. J. Lopes;F. C. Zawislak;P. F. P. Fichtner;R. M. Papaleo;F. C. Lovey;A. M. Condo;A. J. Tolley .Formation of epitaxial β-Sn islands at the interface of SiO_2/Si layers implanted with Sn ions[J].Applied physics letters,2005(19):191914.1-191914.3.
[11] J. P. Zhao;Y. Meng;D. X. Huang;W. K. Chu;J. W. Rabalais .Sn quantum dots embedded in SiO_2 formed by low energy ion implantation[J].Journal of Vacuum Science & Technology, B. Microelectronics and Nanometer Structures: Processing, Measurement and Phenomena,2007(3):796-800.
[12] Spiga S.;Mantovan R.;Fanciulli M.;Ferretti N.;Boscherini F.;d'Acapito F.;Schmidt B.;Grotzschel R.;Mucklich A. .Local structure of Sn implanted in thin SiO2 films - art. no. 205419[J].Physical review, B. Condensed matter and materials physics,2003(20):5419-0.
[13] Ragan R;Min K S;Atwater H A .Direct energy gap group Ⅳ semiconductor alloys and quantum dot arrays in SnxGe1-x/Ge and SnxSi1-x/Si alloy systems[J].Materials Science and Engineering B,2001,87(03):204.
[14] Void-mediated formation of Sn quantum dots in a Si matrix[J].Applied physics letters,2003(24):4262-4264.
[15] Ragan R;Atwater HA .Diamond cubic Sn-rich nanocrystals: synthesis, microstructure and optical properties[J].Applied physics, A. Materials science & processing,2005(6):1335-1338.
[16] Shujuan Huang;Eun-Chel Cho;Gavin Conibeer;Martin A. Green;Daniel Bellet;Edith Bellet-Amalric;Shuying Cheng .Fabrication and characterization of tin-based nanocrystals[J].Journal of Applied Physics,2007(11):114304-1-114304-6-0.
上一张 下一张
上一张 下一张
计量
  • 下载量()
  • 访问量()
文章评分
  • 您的评分:
  • 1
    0%
  • 2
    0%
  • 3
    0%
  • 4
    0%
  • 5
    0%