利用二极溅射的方法在不同衬底上沉积了Fe-N-O薄膜.通过扫描电子显微镜(SEM)、光电子能谱(XPS)和透射电子显微镜(TEM)等先进实验分析手段对二极溅射沉积Fe-N-O薄膜的形貌与结构进行了分析.XPS和TEM的结果表明,薄膜的主要成分为FeO和少量的Fe16N2多晶体组成,生长上存在择优取向;表面均匀、致密、平整,晶粒大小在50nm左右.
The Fe-N-O thin films were two-pole sputtered on different substrates. The surface morphology, composition and structure character of the Fe-N-O thin films were studied by scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS) and transmission electron microscopy (TEM). The results of XPS and TEM show that the main phase of Fe-N-O film was FeO, but have a little Fe16 N2. The orientation of the deposited films was found through the results of TEM. The films were nanocrystalline, having crystal size of 50nm or less.
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