欢迎登录材料期刊网

材料期刊网

高级检索

单晶表面加工损伤是衡量工艺水平以及单晶片质量的一个主要参数.综述对单晶表面加工损伤进行分析评价的各种方法,对各种分析方法的基本原理、主要特点及应用做了概要介绍.由于单晶表面损伤以及表面残余应力存在一定的梯度及各种表征方法的作用机理、作用深度不尽相同,因此不同的评价方法对同一样品的分析往往会出现差异.根据不同的分析目的,给出了选择分析手段的建议.

参考文献

[1] 姚英.磨抛工艺中HgCdTe晶片的表面损伤[J].红外技术,1994(05):15.
[2] 赵国庆.卢瑟福背散射分析[J].理化检验-物理分册,2002(01):41-46.
[3] 董国全,万群,陈坚邦.GaAs抛光表面损伤的RBS研究[J].稀有金属,1998(04):317.
[4] 杨国伟.金刚石及相关薄膜制备研究进展[J].材料导报,2000(01):44-46.
[5] 王晓泉,杨德仁,席珍强.多晶硅太阳电池用SiN薄膜的研究进展[J].材料导报,2002(03):23-25.
[6] 卢焕明;赵轶;叶志镇 .高精度X射线双晶衍射仪的原理及其应用[J].材料科学与工程,1998,15(04):51.
[7] 张银霞.单晶硅片超精密加工表面\亚表面损伤检测技术[J].电子质量,2004(07):72-75.
[8] 陈坚邦,钱嘉裕,杨钧.TEM观察砷化镓晶片损伤层[J].稀有金属,1998(05):392-395.
[9] 廖乾初.电子通道花样分析技术的进展[J].电子显微学报,1999(02):223-233.
[10] 童玉珍,张国义,Ming S.Liu,L.A.Bursill.GaN薄膜的微区Raman散射光谱[J].半导体学报,2000(06):554-558.
[11] 刘峥;翟富义;张椿 等.P〈111〉硅磨片表面损伤的研究[J].稀有金属,1997,21(02):139.
[12] Kanaya M;Yashiro H;Ohtani N et al.Characterization of mechanically polished surfaces of single crystalline 6H-SiC[J].Materials Science Forum,1998,264(01):359.
[13] Takahiro YAMADA;Kaoru MIZUNO;Kuninori KITAHARA;Akihiro MORITANI .Investigation of Surface Damage in Si Exposed to Ar Plasma by Spectroscopic Ellipsometry and Grazing X-Ray Diffraction[J].Japanese journal of applied physics,2005(1A):67-74.
[14] David Black .Strength-Limiting Surface Damage in Single-Crystal Sapphire Imaged by X-ray Topography[J].Journal of the American Ceramic Society,2001(10):2351-2355.
[15] Alves E;DaSilva M F;Soares J C et al.RBS lattice site location and damage recovery studies in GaN[J].MRS Internet Journal of Nitride Semiconductor Research,1999,4(01):7.
[16] Ding FR.;He W.;Vantomme A.;Zhao Q.;Pipeleers B.;Jacobs K.;Moerman I. .Zn channeled implantation in GaN: damages investigated by using high resolution XTEM and channeling RBS[J].Materials Science & Engineering, B. Solid-State Materials for Advanced Technology,2003(1):70-73.
[17] B. C. Johnson;J. C. McCallum .Ion-channeling and Raman scattering study of damage accumulation in silicon[J].Journal of Applied Physics,2004(3):1096-1101.
[18] Choi K Y;Kim S S .Morphological analysis and classification of types of surface corrosion damage by digital image processing[J].Corrosion Science,2005,47(01):1.
[19] Mackova A;Groetzschel R;Eichhorn F;Nekvindova P;Spirkova J .Characterization of Er : LiNbO3 and APE : Er : LiNbO3 by RBS-channeling and XRD techniques[J].Surface and Interface Analysis: SIA: An International Journal Devoted to the Development and Application of Techniques for the Analysis of Surfaces, Interfaces and Thin Films,2004(8):949-951.
[20] Sung I H;Kim D E .Surface damage characteristics of selfassembled monolayers of alkanethiols on metal surfaces[J].Tribology Letters,2004,17(04):835.
[21] Hervé Bercegol;Laurent Lamaignère;Vincent Cavaro et al.Filamentation and surface damage in fused silica with single-mode and multi-mode pulses[J].Laser Induced Damage in Optical Materials,2005,5991:59911Z.
[22] Lawrence Hrubesh;John Adams;Michael Feit et al.Surface damage growth mitigation on KDP/DKDP optics using singlecrystal diamond micro-machining[J].Laser Induced Damage in Optical Materials,2003,5273:273.
[23] Liberman V;Rothschild M;Palmacci S T et al.Accelerated damage to blank and antireflectance-coated CaF2 surfaces under 157-nm laser irradiation[J].Optical Microlithography ⅩⅥ,2003,5040:1631.
[24] Vogt J.;Weiss H. .The structure of NaCl(100) and KCl(100) single crystal surfaces: a tensor low energy electron diffraction analysis[J].Surface Science: A Journal Devoted to the Physics and Chemistry of Interfaces,2001(1/2):155-168.
[25] Hervé Bercegol;Alain Boscheron;Christian Lepage et al.Self-focusing and surface damage in fused silica windows of variable thickness with UV nanosecond pulses[J].Laser Induced Damage in Optical Materials,2003,5273:136.
[26] Atte Haapalinna;Saulius Nevas;Dietmar Pahler .Rotational grinding of silicon wafers--sub-surface damage inspection[J].Materials Science & Engineering, B. Solid-State Materials for Advanced Technology,2004(3):321-331.
[27] Seydel E;Berger H;Hildebrandt G.Lattice Damages in Quartz Crystal Blanks -Influence on the Resonator Properties and on the X-ray Measurement[A].,2004:109.
[28] Alves E;Ruiz C M;Dieguez E et al.RBS analysis of AlGaSb thin films[J].Nuclear Instruments and Methods in Physics Research,2004,219-210(1-4):928.
[29] J. Yu;J. Liu;J. Zhang .TEM investigation of FIB induced damages in preparation of metal material TEM specimens by FIB[J].Materials Letters,2006(2):206-209.
[30] Brooker A D;Leak D M;Lainchbury M J et al.SEM-Raman spectroscopy[J].Design and Nature,2004,6:573.
上一张 下一张
上一张 下一张
计量
  • 下载量()
  • 访问量()
文章评分
  • 您的评分:
  • 1
    0%
  • 2
    0%
  • 3
    0%
  • 4
    0%
  • 5
    0%