采用脉冲偏压电弧离子镀技术在玻璃基片上制备均匀透明的非晶二氧化钛薄膜，在0～900V范围内改变脉冲偏压幅值，考察其对氧化钛薄膜光学性能的影响。结果表明，室温下沉积态薄膜为非晶态。脉冲偏压对薄膜光学性能有明显的影响。随着脉冲偏压的升高，薄膜沉积速率以100V为界先高后低；薄膜的吸收边先红移后蓝移，但光学带隙Eg基本无变化，约为3.27eV；300V偏压时薄膜达到原子级表面平滑度，RRMS为0.113nm，因而薄膜折射率也最高，nλ＝550达到已有报道的最高值2.51。
Uniform and transparent amorphous titanium dioxide films were prepared on glass by pulsed bias arc ion plating at room temperature. The influence of pulsed bias on the film optical property was investigated by varying the bias from 0V to 900V. The results show the as-deposited films are amorphous. The bias greatly affects film optical property. The deposition rate first increase and then decrease with increasing the bias, and the peak appears at 100V. As the bias increases, the film absorption edge shifts to the red side first, and then to the blue. While the band gap almost keeps constant, about 3.27eV. The film deposited at 300V reaches atomic smoothness, and RRMS is 0.113nm, which results in the highest refractive index, and nλ＝550 is 2.51, more or equal to the maximum value reported ever.
参考文献
| [1] | |
| [2] | |
| [3] | |
| [4] | |
| [5] | |
| [6] | |
| [7] | |
| [8] | |
| [9] | |
| [10] | |
| [11] | |
| [12] |
- 下载量()
- 访问量()
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%