铌-铬复合溅射膜对锆合金基体的附着性

稀有金属材料与工程, 2004, 33(6): 598-601.

铌-铬复合溅射膜对锆合金基体的附着性

范洪远 ^1, , 樊庆文 ^2, , 向文欣 ^3, , 李伟 ^4, , 邱绍宇 ^5, , 应诗浩 ^6, , 张西鹏 ^7, , 沈保罗 ^8,

1.四川大学,四川,成都,610065;中国核动力研究设计院,四川,成都,610041

2.四川大学,四川,成都,610065

3.中国核动力研究设计院,四川,成都,610041

4.四川大学,四川,成都,610065

5.中国核动力研究设计院,四川,成都,610041

6.中国核动力研究设计院,四川,成都,610041

7.四川大学,四川,成都,610065

8.四川大学,四川,成都,610065

基金项目: 国家重点实验室基金(51481080101SC0101)

关键词：锆合金 , 铬膜 , 铌膜 , 复合 , 附着性

Adhesion of Composite Films of Niobium Layer and Chromium Layer Sputtered on Zirconium Alloy Substrates

研究了铬膜和铌膜的复合对锆合金基体上制备的直流磁控溅射薄膜附着性的影响.使用扫描电镜(SEM)观察了膜层界面,用原子力显微镜(AFM)观察了膜层表面,用划痕法测定了薄膜的附着性.结果表明:膜/基界面结合良好,界面成分升降区狭窄;铬膜与铌膜组成的复合薄膜结合紧密;铬膜的组织为致密、边界孔洞少的纤维状晶粒,铬膜厚度为2 μm时,晶粒仍为亚微米级,但晶粒顶面已出现拱形;膜厚同为2μm时,外层1μm铌膜+内层1 μm铬膜组成的复合膜的附着性分别是外层1 μm铬膜+内层1μm铌膜组成的复合膜的2.35倍、2 μm铬膜附着性的3倍,其原因在于膜层组织及力学性能变化、铌膜韧性好和复合顺序.因此,依靠铬膜厚度的增加来提高铬膜保护性的方法具有较大局限性,通过在一定厚度的铬膜外复合铌膜的方法则有较好的可行性.

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