在低压无磨料条件下,利用碱性FA/O型螯合剂具有极强螫合能力的特性,对铜互连线进行化学机械平坦化,获得了高抛光速率和表面一致性.提出了铜表面低压无磨料抛光技术的平坦化原理,在分析了抛光液化学组分与铜化学反应机理的基础上,对抛光液中的主要成分FA/O型螯合剂、氧化剂的配比和抛光工艺参数压力、抛光机转速进行了研究.结果表明:在压力为6.34 kPa和抛光机转速为60 r/min时,抛光液中添加5％螯合剂与1％氧化剂(体积分数,下同),抛光速率为1825 nm/min,表面非均匀性为0.15.
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