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碳纳米管具有良好的电子发射特性,成为理想的场致发射阴极材料,碳纳米管阵列制备研究是碳纳米管平板显示应用的前提.介绍了碳纳米管阴极阵列制备技术如丝网印制法、CVD原位生长法、光刻法和自组织法等研究与进展,并从薄膜残留去除、CNTs膜微结构改变及sp3缺陷增加等方面概述了目前CNTs场发射性能优化的进展,指出了目前存在的问题并作了简单分析.

参考文献

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