SIMS Studies of Tracer Diffusion of Al in Thin Film Nanocrystalline Cu

材料科学技术（英）, 1993, 9(4): 297-300.

SIMS Studies of Tracer Diffusion of Al in Thin Film Nanocrystalline Cu

Honggang JIANG Jingtang WANG Bingzhe DING Qihong SONG State Key Lab.of RSA , Institute of Metal Research , Academia Sinica , Shenyang , 110015 , China

Keywords： tracer diffusion , null , null

Diffusion of Al in thin film nanocrystalline Cu(18 nm)has been investigated by means of second ion mass spectroscopy(SIMS).In the experimental temperature ranges from 421 to 773 K,there seem- ingly exists two diffusion mechanisms.The impurity elements O and C are supposed to accumulate to the grain boundaries and inhibit the fast grain boundary diffusion.

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SIMS Studies of Tracer Diffusion of Al in Thin Film Nanocrystalline Cu

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