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采用在铁基触媒中加入硼铁粉的方法制成Fe-Ni-C-B系触媒,用静压法合成含硼金刚石。研究了含硼金刚石的形貌、晶体结构和电阻-温度曲线。实验结果表明,在不同温度区间内,金刚石具有不同的电离能,分析了其原因。同时测得此含硼金刚石的最高工作温度为773K左右。为高温半导体金刚石的研究提供了实验基础。

In present paper,boron-doped diamond was synthesized by static pressure method using Fe-Ni-C-B system catalyst.The morphology,crystal structure,resistance-temperature characteristic curve were studied.Experiments proved that the boron-doped diamond has different ionization energy at different temperature range and the reason is analyzed.The maximum operating temperature is about 773K for such boron-doped diamond.This study provides an experimental basis for high-temperature semiconductor diamond.

参考文献

[1] 王美,李和胜,李木森,宫建红,田彬.硼掺入量对含硼金刚石单晶热稳定性的影响[J].高压物理学报,2008(02):215-219.
[2] 宫建红,李木森,许斌,亓永新,刘会刚.含硼触媒对合成的金刚石晶体结构和热稳定性的影响[J].金刚石与磨料磨具工程,2005(01):18-21.
[3] 李尚升,刘书强,李小雷,宿太超,肖宏宇,马红安,罗宁,王利英,贾晓鹏.Ⅱb型宝石级金刚石的表征及半导体特性研究[J].功能材料,2010(z1):165-167.
[4] Deguchi M.;Hirao T.;Kitabatake M. .ELECTRICAL PROPERTIES OF BORON-DOPED DIAMOND FILMS PREPARED BY MICROWAVE PLASMA CHEMICAL VAPOUR DEPOSITION[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,1996(1/2):267-270.
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