<正> Egami等曾提出Fe_(80)B_(20)溅射合金的T_(Cr)比同成分液淬合金高50K;Tsumashima等则报道Fe基溅射薄膜的T(Cr)比液淬合金略低或相等,Herold等用电镜方法研究了蒸发FeB合
The thermal stability of amorphous Fe_78Co_4.3Si_5.9B_11.8 thin film prepared by sputtering has been studied using thermomagnatie measurements, differential thermal analysis, electron microscopic analysis, electron diffraction and X-ray diffraction. It is observed that the crys-tallization process of sputtering film is different from that of melt quenching ribbons. The crystallization temperature of the former is much lower than that of latter. The preparing condition have an important effect on the thermal stability.
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