采用等离子体浸没与离子注入装置,以CF4和CH4作为源气体,在Si(100)基片上制备了含氟量不同的一系列氟化非晶态碳膜.通过XPS、FTIR和Raman对其结构进行了表征.采用躺滴法测量薄膜与双蒸水之间的接触角.薄膜硬度通过纳米压痕仪进行测量.XPS和FTIR结果表明存在C-CF、C-Fx基团和少量的氧.我们认为薄膜中存在的氧元素是由于薄膜在正常存放时发生了时效过程,其中的悬挂键发生化学吸附反应引起的.Raman和接触角测量结果表明,随着氟元素含量的逐渐增加,薄膜从典型的类金刚石状结构逐渐转化为类聚合物状结构,接触角逐渐增大.纳米压痕测量结果表明,氟元素的加入使得薄膜的硬度有很大程度的降低.
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