以甲基丙烯酸(MAA)、甲基丙烯酸甲酯(MMA)、甲基丙烯酸羟乙酯(HEMA)和2-甲基-2-金刚烷基甲基丙烯酸酯(MAdMA)为单体,通过自由基聚合制备了不同MAdMA含量的共聚物PMMHM,再与甲基丙烯酸缩水甘油酯(GMA)反应制得光敏共聚物PMMHM-G.用傅里叶变换红外光谱、核磁共振氢谱、凝胶渗透色谱、差示扫描量热等表征了聚合物的结构与性能;以PMMHM-G为基体树脂配制了光致抗蚀剂,测试了抗蚀剂膜的硬度与附着力,并用扫描电子显微镜观测了光致抗蚀剂的分辨率.结果表明,随着MAdMA含量升高,共聚物的相对分子质量下降,玻璃化转变温度升高,树脂的耐碱性增强,光致抗蚀剂的硬度和附着力良好,分辨率达50μm.
参考文献
| [1] | Chae KH.;Sun GJ.;Kang JK.;Kim TK. .A water-developable negative photoresist based on the photocrosslinking of N-phenylamide groups with reduced environmental impact[J].Journal of Applied Polymer Science,2002(5):1172-1180. |
| [2] | Nasrullah JM.;Dhamodharan R. .Synthesis and characterization of statistical copolymers of styrene and 4-(1-hydroxyalkyl)styrene[J].Journal of Applied Polymer Science,2004(3):1902-1914. |
| [3] | Cho H;Kim J;Patil P;Kim JY;Kim TH .Synthesis of succinylated poly(4-hydroxystyrene) and its application for negative-tone photoresist[J].Journal of Applied Polymer Science,2007(6):3560-3566. |
| [4] | 舒航,刘敬成,王春林,刘仁,张胜文,刘晓亚.光敏甲基丙烯酸酯共聚物的合成及在负性光致抗蚀剂中的应用[J].高分子材料科学与工程,2012(11):22-26. |
| [5] | Kesters, E;Claes, M;Le, QT;Lux, M;Franquet, A;Vereecke, G;Mertens, PW;Frank, MM;Carleer, R;Adriaensens, P .Chemical and structural modifications in a 193-nm photoresist after low-k dry etch[J].Thin Solid Films,2008(11):3454-3459. |
| [6] | 冯宗财,陈毅敏,王跃川,陈波,杜春蕾.高支化碱溶性聚酯的合成及光成像研究[J].功能材料,2002(01):101-104. |
| [7] | 回闯,孟庆伟,宫斌,曲景平.甲基丙烯酸（2-烷基-2-金刚烷）酯的合成及水解研究[J].感光科学与光化学,2007(05):357-363. |
| [8] | 王慧,游凤祥,陈明.高玻璃化温度化学增幅光致抗蚀剂的制备[J].感光科学与光化学,1998(03):245. |
| [9] | Fleischmann, S;Percec, V .Synthesis of Well-Defined Photoresist Materials by SET-LRP[J].Journal of Polymer Science, Part A. Polymer Chemistry,2010(10):2251-2255. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%