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采用直流磁控溅射的方法,在Si(111)基片上沉积AlN(100)面择优取向薄膜,研究了溅射功率对AlN薄膜结构及表面粗糙度的影响.结果表明,随着溅射功率的增加,沉积速率增大,但薄膜结构择优取向度变差,表面粗糙度增大,这说明要制备择优取向良好、表面粗糙度小的AlN薄膜,需选择较小的溅射功率.

参考文献

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