采用湿法化学法在太阳能级Si(100)表面沉积Ag纳米颗粒,并对Ag颗粒进行了退火处理.利用扫描电子显微镜研究了不同沉积时间及退火工艺对硅片表面Ag纳米颗粒形貌的影响规律.在此基础上采用退火前后的Ag纳米颗粒辅助化学腐蚀法制备了黑硅减反射结构,并用扫描电子显微镜观察了所制备黑硅的微结构,用紫外-可见分光光度计研究了所制备黑硅的反射率.研究表明,制备的Ag颗粒为不规则片状结构,并且随Ag沉积时间的延长,Ag颗粒逐渐长大.通过对样品退火处理,Ag颗粒收缩成球状纳米颗粒.利用未退火的Ag颗粒制备的黑硅呈不规则纳米线状微结构,在300 ～ 1100 nm范围内平均反射率为2.7％;而利用退火后球状Ag纳米颗粒制备的黑硅则呈多孔状微结构,同样波长范围内平均反射率为14.2％.
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