采用直流磁控溅射法在载玻片上制备Cr/Gd/Cr薄膜.利用XRD和VSM对薄膜的微观结构和低温磁特性进行研究.结果表明:薄膜的Tc=297 K,高于块体Gd的Tc=293 K,薄膜中的铁磁层Gd与反铁磁层Cr的自旋在界面表现出铁磁耦合特征,当温度分别在80～200 K和250～290 K时,矫顽力和交换偏置场随温度表现出正常的变化规律,但温度为200～250 K时,随温度的升高,Gd的自发磁矩方向发生变化,铁磁相Gd与反铁磁相Cr之间的耦合作用减弱,表现出交换偏置场减小、矫顽力增大的反常变化.
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