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以3,3′,4,4′-联苯四甲酸二酐和4,4′-二氨基二苯醚为单体,以三聚氰胺为成孔剂,制得一种聚酰亚胺多孔薄膜,并对薄膜的微观结构、力学性能及介电常数等进行测试。结果表明:制备该聚酰亚胺多孔薄膜的成孔工艺简单可行,三聚氰胺成孔剂可用热水溶解的方法去除。多孔薄膜孔洞数量多,且分布比较均匀。薄膜的介电常数较低、力学性能良好、吸湿率较低。当三聚氰胺添加量分别为25%和40%时,聚酰亚胺多孔薄膜的介电常数分别为1.82和1.36,聚酰亚胺多孔薄膜的拉伸强度分别为86 MPa和74 MPa,断裂伸长率分别为15%和10%。

A polyimide porous film was prepared by using 3,3’,4,4’-biphenyltetracarboxylic dianhydride and 4,4’-diaminodiphenyl ether as monomer, melamine as pore-forming agent, and its microstructure, mechanical properties, and dielectric constant were tested. The results show that the pore-forming process of the polyimide porous film is simple and feasible, and the melamine can be dissolved by hot water. The porous films have a great number of pores and their distribution is uniform. And the porous poly-imide films have low dielectric constant, good mechnical properties, and low water absorption. When the melamine addition content is 25% and 40%, the dielectric constant of the porous polyimide film is 1.82 and 1.36, the tensile strength is 86 MPa and 74 MPa, and the elongation at break is 15% and 10%, respectively.

参考文献

[1] Benjamin D. Hatton;Kai Landskron;William J. Hunks;Mark R. Bennett;Donna Shukaris;Douglas D. Perovic;Geoffrey A. Ozin .Materials chemistry for low-k materials[J].Materials Today,2006(3):22-31.
[2] Kousuke Tsuchiya;Hirotoshi Ishii;Yuji Shibasaki;Shinji Ando;Mitsuru Ueda .Synthesis of a Novel Poly(binaphthylene ether) with a Low Dielectric Constant[J].Macromolecules,2004(13):4794-4797.
[3] Ken-ichi Fukukawa;Yuji Shibasaki;Mitsuru Ueda .A Photosensitive Semi-Alicyclic Poly(benzoxazole) with High Transparency and Low Dielectric Constant[J].Macromolecules,2004(22):8256-8261.
[4] 王铎.聚酰亚胺低介电常数材料的研制[J].宇航材料工艺,2007(04):37-39.
[5] 李广,殷景华,刘晓旭,冯宇,田付强,雷清泉.PI/AIN纳米复合薄膜结构与介电性能研究[J].绝缘材料,2011(06):21-24.
[6] Krause B;Koops G H;van der Vegt N F A et al.Ul-tralow-k DieIectrics Made by Supercritical Foaming of Thin Polymer Films[J].Advanced Materials,2002,14(15):l041-1046.
[7] Shimizu H;Kawakami H;Nagaoka S .Membrane Formation Mechanism and Permeation Properties of a Novel Porous Polyimide Membrane[J].PolymAdv Technol,2002,13(5):370-380.
[8] Jiang LZ;Liu JG;Wu DZ;Li HQ;Jin RG .A methodology for the preparation of nanoporous polyimide films with low dielectric constants[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2006(1/2):241-246.
[9] Wang W C;Vora R H;Kang E T et al.Nanoporous Ultralow-k Films Prepared from Fluorinated Polyimide with Grafted Poly(acrylic acid)Side Chains[J].Advanced Materials,2004,16(1):54-57.
[10] Lin J J;Wang X D .Novel Low-k Polyimide/mesoporous Silica Composite Films:Preparation,Microstructure,and Properties[J].POLYMER,2007,48(1):318-329.
[11] 马兰杰,杨志强,党智敏.聚酰亚胺/介孔二氧化硅复合薄膜的介电性能研究[J].绝缘材料,2008(02):60-63.
[12] 赵春宝,金鸿,陈森,赵玮.低介电常数聚酰亚胺材料制备的研究进展[J].绝缘材料,2010(02):33-37.
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