在室温下,应用对靶直流磁控溅射设备在普通玻璃基片上制备了FePt(30nm)/Ti(tnm)颗粒膜样品,随后,在真空中进行了原位退火.详细研究了Ti衬底层对FePt颗粒膜的微结构和磁特性的影响.X射线衍射图谱表明样品形成了较有序的L10织构,Ti和FePt形成了三元FePtTi合金.当Ti层厚度t=5 nm、退火温度Ta=500℃时,样品具有高度有序的L10织构、小的颗粒尺寸和优异的磁特性.矫顽力超过了6.7 kOe,饱和磁化强度为620emu/cc.并且具有较小的开关场分布.结果表明FePt/Ti颗粒膜系统可作为超高密度磁记录介质的候选者.
FePt (30 nm)/Ti (t nm)granular films were prepared by DC facing-target magnetron sputtering system onto glass substrates at room temperature and subsequently in situ annealed in vacuum. The influence of Ti on microstructural and magnetic properties of the FePt films was investigated in detail. X-ray diffraction (XRD) patterns indicate that the films deposited onto glass substrates with the addition of Ti layer form a ternary FePtTi alloy possessing L10 texture. The film with perfectly ordered L10 structure was obtained at t = 5 nm and Ta = 500 ℃, which had ultra-small grain size and unique magnetic properties. The maximum coercivity and saturation magnetization reached more than 6.7×7.96×104A.m-1 and 620emu/cc,respectively. The small switching field distribution (SFD) was obtained. The results showed that this system might be applicable to ultra-high-density magnetic recording media.
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