研究了低氧分压反应溅射法生长的SnO2薄膜于600℃ O2气氛和Ar气氛退火处理后的表面形貌、晶体结构以及表面成分,发现经氧化性气氛退火处理的SnO2为具有金红石结构的表面多孔薄膜.相比较而言,Ar气氛退火处理后的SnO2薄膜表面较为致密,相结构包含朱氧化完全的β-Sn.XPS分析进一步表明,氧化性气氛退火形成单一组分的SnO2,而惰性气氛退火后薄膜表面含有Sn、SnO和SnO2.另外,研究还发现薄膜表面吸附氧形态与退火气氛有关.
SnO2 thin films, deposited by reactive magnetron sputtering under low oxygen partial pressure, are annealed in oxygen and argon atmosphere,respectively. Morphology, phase structure and surface compositions are investigated through SEM,XRD and XPS at room temperature. It is observed that the SnO2 thin film annealed in oxygen atmosphere is rutile structure with porous surface. On the other hand,Sn, SnO and SnO2 are detected on compact surface of the thin film annealed in argon atmosphere. Furthermore,it is confirmed that the forms of the adsorbed oxygen depend on annealed atmosphere.
参考文献
| [1] | A. Clementi;N. Chiodini;A. Paleari .Cubic optical nonlinearity in nanostructured SnO_(2):SiO_(2)[J].Applied physics letters,2004(6):960-962. |
| [2] | Advani G;Jordan A .Thin films of SnO as solid-state gas sensor[J].Journal of Electronic Materials,1990,9:29. |
| [3] | Liu W;Huang X;Wang Z et al.Studies of stannic oxide as an anode material for lithium-ion batteries[J].Elecrtochem Soc,1999,1:145. |
| [4] | Manea E;Budianu E;Purica M.Optical characterization of SnO2 thin films,prepared by sol-gel method,for "Honeycomb" textured silicon solar cells[A].,2006:179. |
| [5] | Su Ming;Dravid;Vinayak P .Nanodisk sensor and sensor array[P].US,7155959,2007. |
| [6] | Sinha N P;Misra M .X-ray diffraction analysis of SnO2 films prepared by oxidation of tin films[J].THIN SOLID FILMS,1983,101:L33. |
| [7] | Sen S K;Sen S;Bauer C L .Determination of the oxidation states of tin by Auger electron spectroscopy[J].THIN SOLID FILMS,1981,82:157. |
| [8] | Huang Jow-Lay;Kon Din-wen;Shen Bor-Yuan .The effects of heat treatment on the gas sensitivity of reactively sputtered[J].Surface and Coatings Technology,1996,79:2637. |
| [9] | Yuan L;Guo Z P;Konstantinov K et al.Nano-structured spherical porous SnO2 anodes for lithium-ion hatteries[J].Journal of Power Sources,2006,159:345. |
| [10] | Wagner C D;Riggs W M;Davis L E.Handbook X-ray photoelectron spectroscope[M].USA:Perkin-Elmer Corporation,Physical Electronic Division,1979 |
| [11] | Brinzari V;Korotcenkov G;Velltruska K.XPS study of gas sensitivity SnO2 thin film[A].,2000:127. |
- 下载量()
- 访问量()
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%