{"currentpage":1,"firstResult":0,"maxresult":10,"pagecode":5,"pageindex":{"endPagecode":5,"startPagecode":1},"records":[{"abstractinfo":"对电子束物理气相沉积高硅硅钢片进行了高温快速退火处理.用SEM,EDS,XRD对制备态硅钢片和热处理态组织,成分,物相进行了表征,并测试了其电阻率和磁滞回线.结果表面:高温快速退火使高硅硅钢片硅成分变均匀,靠近基板侧的相由Fe3Si变成DO3;硅钢片中孔长大,电阻率从90μΩ·m增大到160μΩ·m,矫顽力减小,磁感应强度减小.","authors":[{"authorName":"李晓","id":"bc23871f-df5c-4643-97ae-847f40d19840","originalAuthorName":"李晓"},{"authorName":"孙跃","id":"b049c258-8320-4e9d-9eb6-9c25d640eb76","originalAuthorName":"孙跃"},{"authorName":"赫晓东","id":"aa5e8686-7801-42e6-b939-b40f5ce0a142","originalAuthorName":"赫晓东"}],"doi":"","fpage":"1603","id":"345ef55a-0411-4ba1-88d9-2764c9074305","issue":"10","journal":{"abbrevTitle":"GNCL","coverImgSrc":"journal/img/cover/GNCL.jpg","id":"33","issnPpub":"1001-9731","publisherId":"GNCL","title":"功能材料"},"keywords":[{"id":"2819656d-aabc-49da-b5cc-07c44fb7b150","keyword":"高温快速退火","originalKeyword":"高温快速退火"},{"id":"9ebaa896-2443-4f44-a095-9e042cca19ea","keyword":"高硅硅钢片","originalKeyword":"高硅硅钢片"},{"id":"93ec0420-af10-45bc-b97f-a2df26198015","keyword":"电子束物理气相沉积","originalKeyword":"电子束物理气相沉积"}],"language":"zh","publisherId":"gncl200710012","title":"高温快速退火对电子束物理气相沉积制备高硅硅钢片的影响","volume":"38","year":"2007"},{"abstractinfo":"本文利用快速退火对 8″直拉硅单晶片中的流动图形缺陷(FPDs)进行了研究.首先用Secco腐蚀液腐蚀了大直径直拉硅片,利用光学显微镜观察了FPDs的宏观分布,并用原子力显微镜(AFM)对原生FPDs的微观形貌进行观察,证明了 FPDs是一种空位型原生缺陷,然后采用了高温快速热处理,分别在N2、N2/O2(3%)、Ar三种气氛中对原生直拉单晶硅片进行了处理.对比退火前后FPDs密度的变化,分析了高温快速热处理对直拉硅单晶片中FPDs的影响,实验表明1200℃快速热处理180s可以显著降低硅片表面的FPDs.","authors":[{"authorName":"郝秋艳","id":"42e69abf-12ab-40fb-ad06-29074a6af3cf","originalAuthorName":"郝秋艳"},{"authorName":"乔治","id":"32703c44-b914-499f-a903-9aec8d2bf8e3","originalAuthorName":"乔治"},{"authorName":"张建峰","id":"64453786-0b65-4b9f-94d0-2ef1c3d79105","originalAuthorName":"张建峰"},{"authorName":"任丙彦","id":"103c168d-a274-4d37-ad49-877ff3b0bcaa","originalAuthorName":"任丙彦"},{"authorName":"李养贤","id":"87bc4828-0118-49ab-bd5c-1029e6200b35","originalAuthorName":"李养贤"},{"authorName":"刘彩池","id":"b80a5729-64a0-4c1d-868c-008f60529b2b","originalAuthorName":"刘彩池"}],"doi":"10.3969/j.issn.1000-985X.2004.05.011","fpage":"747","id":"96c09d91-d405-4c69-a92d-8fe20c236af4","issue":"5","journal":{"abbrevTitle":"RGJTXB","coverImgSrc":"journal/img/cover/RGJTXB.jpg","id":"57","issnPpub":"1000-985X","publisherId":"RGJTXB","title":"人工晶体学报"},"keywords":[{"id":"c524f613-1eed-48dd-8071-5ba5ceab99a8","keyword":"CZSi","originalKeyword":"CZSi"},{"id":"c34efbcc-8b8f-4159-b7d6-49fcec1c0d9f","keyword":"原生微缺陷","originalKeyword":"原生微缺陷"},{"id":"068cb9d3-203e-40db-a4c4-74017db301b9","keyword":"流动图形缺陷","originalKeyword":"流动图形缺陷"},{"id":"18bb9b84-d502-4462-83a4-4464f2a89011","keyword":"原子力显微镜","originalKeyword":"原子力显微镜"},{"id":"5a597f33-99d1-421d-b5c4-37593d35e463","keyword":"快速退火","originalKeyword":"快速退火"}],"language":"zh","publisherId":"rgjtxb98200405011","title":"快速退火对大直径CZSi单晶中原生微缺陷的影响","volume":"33","year":"2004"},{"abstractinfo":"利用XRD、DSC以及TEM方法研究了快速凝固Al-20Si-5Fe合金退火态的微观组织、弥散相结构和相转变.结果表明,快凝Al-20Si-5Fe合金组织中存在两种弥散相,δ-Al4FeSi2和初生Si相.退火温度低于310℃时,δ-Al4FeSi2相未明显粗化;当退火温度高于310℃时,亚稳相δ-Al4FeSi2转变成稳定相β-Al5FeSi,β-Al5FeSi相随退火温度的提高而明显粗化.高温退火使初生Si相发生一定的重溶和粗化,但粗化速率显著低于β-Al5FeSi相,原因在于合金中Fe元素抑制了Si相的粗化.","authors":[{"authorName":"陈翌庆","id":"7425f4dd-808e-45c9-9414-0a34de1aade6","originalAuthorName":"陈翌庆"},{"authorName":"苏勇","id":"7533ea37-e63d-4ab4-a9a4-d1033ff2637a","originalAuthorName":"苏勇"},{"authorName":"丁厚福","id":"88ad0639-89c6-4884-a049-4d732ce24de3","originalAuthorName":"丁厚福"},{"authorName":"黄新民","id":"b8bd7e51-29c8-4272-9edb-3c11f1f4679e","originalAuthorName":"黄新民"},{"authorName":"郑玉春","id":"fbbb4d31-abd2-46ff-b95c-16dec9e99523","originalAuthorName":"郑玉春"}],"doi":"10.3969/j.issn.1009-6264.2000.03.009","fpage":"46","id":"536f7548-c178-4c42-8667-21c2796fccd2","issue":"3","journal":{"abbrevTitle":"CLRCLXB","coverImgSrc":"journal/img/cover/CLRCLXB.jpg","id":"15","issnPpub":"1009-6264","publisherId":"CLRCLXB","title":"材料热处理学报"},"keywords":[{"id":"e35c2060-299f-4b7d-a1f1-9cdafd6caa45","keyword":"快速凝固","originalKeyword":"快速凝固"},{"id":"c330f0e4-c9b9-4ae5-a7eb-312943699592","keyword":"Al-Si-Fe合金","originalKeyword":"Al-Si-Fe合金"},{"id":"0c38e156-e5fe-4db2-91cd-c5f67f2e707c","keyword":"退火组织","originalKeyword":"退火组织"}],"language":"zh","publisherId":"jsrclxb200003009","title":"快速凝固Al-20Si-5Fe合金的退火组织变化","volume":"21","year":"2000"},{"abstractinfo":"研究了快速凝固的Al-5Si-1Ti 合金在退火过程中显微组织的变化,对产生这些变化的原因进行了探讨。元素Ti 对合金组织的稳定性及高度弥散物的形成具有重要作用。该合金具有潜在的保持良好的室温和高温力学性能以及耐磨性能的能力。","authors":[{"authorName":"仝兴存","id":"338c13d8-36fa-4128-9ab1-5a172cc65a2e","originalAuthorName":"仝兴存"},{"authorName":"沈宁福","id":"5fbed8e9-fb05-4c03-b953-0fd598d80afd","originalAuthorName":"沈宁福"}],"categoryName":"|","doi":"","fpage":"221","id":"95da3508-0136-436d-9e2b-4e95aaa82086","issue":"3","journal":{"abbrevTitle":"CLYJXB","coverImgSrc":"journal/img/cover/CLYJXB.jpg","id":"16","issnPpub":"1005-3093","publisherId":"CLYJXB","title":"材料研究学报"},"keywords":[{"id":"d3b8e3c3-77f8-41c9-b0eb-f37b2010eca1","keyword":"快速凝固","originalKeyword":"快速凝固"},{"id":"40e74124-e73e-4205-824d-b9e3d248136c","keyword":"Al-Si-Ti alloy","originalKeyword":"Al-Si-Ti alloy"},{"id":"4ffe3497-1fbc-461d-b749-ebb546f62788","keyword":"annealing","originalKeyword":"annealing"}],"language":"zh","publisherId":"1005-3093_1991_3_6","title":"快速凝固 Al—5Si—1Ti 合金的退火行为","volume":"5","year":"1991"},{"abstractinfo":"报道了利用高剂量Ge+注入制备SiGe/Si异质结的工作.100keV、5.3×1016/cm2/cm2 Ge+注入(001)SIMOX膜中,峰值Ge+浓度接近20%.样品在不同温度下进行不同时间的快速退火,X射线衍射分析和背散射沟道谱研究表明:1000°C退火0.5h,退火效果较好;退火时间过短或过长,退火温度过高或过低,都将影响退火效果.","authors":[{"authorName":"罗益民","id":"f74211d6-8165-4bb4-a96e-41eaae772da1","originalAuthorName":"罗益民"},{"authorName":"陈振华","id":"bebc1e88-06e7-4233-a694-341f62ef7498","originalAuthorName":"陈振华"},{"authorName":"黄培云","id":"f68c3f53-e1ba-4079-aa8d-8087c1bd7e8f","originalAuthorName":"黄培云"}],"doi":"","fpage":"101","id":"c7915088-c2b2-4ec9-8cc0-c824aaf2a1dc","issue":"7","journal":{"abbrevTitle":"CLDB","coverImgSrc":"journal/img/cover/CLDB.jpg","id":"8","issnPpub":"1005-023X","publisherId":"CLDB","title":"材料导报"},"keywords":[{"id":"de45605d-e9e4-4ea8-964c-6e946cf50232","keyword":"锗离子注人","originalKeyword":"锗离子注人"},{"id":"ca2ff946-376d-4491-832e-25fdde776d9e","keyword":"SiGe/Si异质结","originalKeyword":"SiGe/Si异质结"},{"id":"65c0f782-8810-4886-9908-db527533a8ff","keyword":"快速退火","originalKeyword":"快速热退火"}],"language":"zh","publisherId":"cldb200407030","title":"硅中高剂量锗离子注入的快速退火研究","volume":"18","year":"2004"},{"abstractinfo":"采用MOCVD工艺在Ts=440℃条件下制备组分Bi/Ti=1.44的非晶态薄膜,经过快速退火处理,制备高度择优取向的Bi4Ti3O12 铁电薄膜,在Ts=400℃条件下制备组分Bi/Ti=1.11的非晶态薄膜,经过快速退火处理,制备高度择优取向的Bi2Ti2O7薄膜,较好的退火温度为630℃、时间为60s;快速退火对薄膜组分的影响不大,在相同的退火温度下,生成43相还是22相取决于退火前薄膜材料的组分.","authors":[{"authorName":"苏学军","id":"2b7ff5bb-46e4-432d-bc87-416de54545f0","originalAuthorName":"苏学军"},{"authorName":"李岩","id":"30a6ee2d-acc5-43a5-9c45-24fb17e553cc","originalAuthorName":"李岩"},{"authorName":"张金春","id":"f32ded8b-1a62-4f43-973f-c68768524739","originalAuthorName":"张金春"}],"doi":"10.3969/j.issn.1004-244X.2002.03.013","fpage":"41","id":"44f441a8-5b8b-4b5b-8b0a-590e15e7acca","issue":"3","journal":{"abbrevTitle":"BQCLKXYGC","coverImgSrc":"journal/img/cover/BQCLKXYGC.jpg","id":"4","issnPpub":"1004-244X","publisherId":"BQCLKXYGC","title":"兵器材料科学与工程 "},"keywords":[{"id":"89d6a15d-4069-4bac-9f02-10734ed067fb","keyword":"MOCVD","originalKeyword":"MOCVD"},{"id":"76179cda-1efd-4b75-9482-6948b618bee4","keyword":"XRD","originalKeyword":"XRD"},{"id":"256dc05e-3fa8-45f6-a22b-123f45b9cb4e","keyword":"快速退火","originalKeyword":"快速退火"},{"id":"1e64910b-8058-47c3-9fbb-b507ae78e836","keyword":"EDAX","originalKeyword":"EDAX"}],"language":"zh","publisherId":"bqclkxygc200203013","title":"Bi4Ti3O12薄膜及快速退火工艺的研究","volume":"25","year":"2002"},{"abstractinfo":"研究了超快速退火对一种冷轧变形量为94.2%的Nb+Ti--IF钢的微观组织和织构的影响。结果表明: 超快速退火(升温速度为300℃/s)提高了钢的再结晶完成温度, 整个再结晶退火可在短至0.41 s内完成。与普通退火(升温速度为20℃/s)后钢的再结晶组织相比, 超快速退火处理后晶粒平均尺寸由12.98 μm细化到10.12 μm, 晶粒长大速度由~3 μm/s提高到~23 μm/s, 且再结晶晶粒内存在大量缠结位错。在极短时间内, 超快速退火再结晶织构仍以均匀、锋锐的{111}//ND有利深冲性能的γ织构为主, 且避免了其它α织构的生成, 有利于使退火板具有良好的成形性能。","authors":[{"authorName":"侯自勇许云波吴迪","id":"ff94003c-282b-4348-87af-4a9ab35969d4","originalAuthorName":"侯自勇许云波吴迪"}],"categoryName":"|","doi":"","fpage":"13","id":"fe729cfd-61a4-4ec4-ba52-118320d6a92a","issue":"1","journal":{"abbrevTitle":"CLYJXB","coverImgSrc":"journal/img/cover/CLYJXB.jpg","id":"16","issnPpub":"1005-3093","publisherId":"CLYJXB","title":"材料研究学报"},"keywords":[{"id":"9cd937a4-ee51-448e-ab76-cc5e9df7ef6f","keyword":"金属材料","originalKeyword":"金属材料"},{"id":"09402d28-686b-4813-8de1-ad5a75390503","keyword":"Nb+Ti–IF steel","originalKeyword":"Nb+Ti–IF steel"},{"id":"f13fb84b-28bf-4388-af43-c1efe8d679fa","keyword":"ultra–short annealing","originalKeyword":"ultra–short annealing"},{"id":"07e209b4-8a9c-4f8f-8c92-73c8bee0d9ee","keyword":"grain size","originalKeyword":"grain size"},{"id":"97c3d075-a307-48cb-bc62-8e3312ea1b2b","keyword":"texture","originalKeyword":"texture"}],"language":"zh","publisherId":"1005-3093_2012_1_1","title":"超快速退火对Nb+Ti--IF钢组织和织构的影响","volume":"26","year":"2012"},{"abstractinfo":"对2种冷轧超低碳钢(Nb+Ti-IF钢和高Nb-IF钢)进行了再结晶退火实验, 对比研究了2种钢在超快速退火(加热速率约为300 ℃/s)下的再结晶组织和织构特征. 结果表明, 在超快速退火工艺下, 含C和Nb量较高的Nb-IF钢再结晶平均晶粒尺寸与普通退火工艺下无明显差别(均为(11.0±0.3) μm), 再结晶织构峰值{223}<472>的取向密度由普通退火工艺下的23.9降低到18.0, 且织构类型分散. 分析表明, 较高的C和Nb含量在超快速退火工艺下推迟再结晶的发生, 提高再结晶温度, 增加了其非γ取向形核所占比率, 恶化<111>//ND取向织构, 是其织构强度减弱的原因. 在超快速退火工艺下, 再结晶平均晶粒尺寸是否细化是高形核密度、极短的长大时间的晶粒细化效应与高晶界迁移速率的晶粒粗化效应相互竞争的结果, 极大变形量和细晶作用产生的高形核密度造成形核点饱和, 降低了超快速退火相对于普通退火工艺的晶粒细化效应, 是晶粒细化不明显的主要因素.","authors":[{"authorName":"侯自勇许云波吴迪","id":"7ffb32f5-0269-4435-b57a-9f4a344d7c0b","originalAuthorName":"侯自勇许云波吴迪"}],"categoryName":"|","doi":"10.3724/SP.J.1037.2012.00115","fpage":"1057","id":"ccbdefba-b57c-416c-8454-3e87bf239e22","issue":"9","journal":{"abbrevTitle":"JSXB","coverImgSrc":"journal/img/cover/JSXB.jpg","id":"48","issnPpub":"0412-1961","publisherId":"JSXB","title":"金属学报"},"keywords":[{"id":"329970fb-4b02-4970-a701-9b71f7c0a1dd","keyword":"超低碳钢","originalKeyword":"超低碳钢"},{"id":"4d51e855-c568-417a-9046-84bf181dbdc7","keyword":"ultra-rapid annealing","originalKeyword":"ultra-rapid annealing"},{"id":"93546bf9-976f-4635-bf73-c109ff155632","keyword":"recrystallization","originalKeyword":"recrystallization"},{"id":"9bcc6749-d82d-4b43-be85-895502806f83","keyword":"microstructure","originalKeyword":"microstructure"},{"id":"ae8974cb-c4cc-4f36-bba2-a06e9c5895f2","keyword":"texture","originalKeyword":"texture"}],"language":"zh","publisherId":"0412-1961_2012_9_4","title":"超快速退火下超低碳钢的再结晶行为研究","volume":"48","year":"2012"},{"abstractinfo":"对2种冷轧超低碳钢(Nb+Ti-IF钢和高Nb-IF钢)进行了再结晶退火实验,对比研究了2种钢在超快速退火(加热速率约为300℃/s)下的再结晶组织和织构特征.结果表明,在超快速退火工艺下,含C和Nb量较高的Nb-IF钢再结晶平均晶粒尺寸与普通退火工艺下无明显差别(均为(11.0±0.3)μm),再结晶织构峰值{223}<472>的取向密度由普通退火工艺下的23.9降低到18.0,且织构类型分散.分析表明,较高的C和Nb含量在超快速退火工艺下推迟再结晶的发生,提高再结晶温度,增加了其非γ取向形核所占比率,恶化<111>//ND取向织构,是其织构强度减弱的原因.在超快速退火工艺下,再结晶平均晶粒尺寸是否细化是高形核密度、极短的长大时间的晶粒细化效应与高晶界迁移速率的晶粒粗化效应相互竞争的结果,极大变形量和细晶作用产生的高形核密度造成形核点饱和,降低了超快速退火相对于普通退火工艺的晶粒细化效应,是晶粒细化不明显的主要因素.","authors":[{"authorName":"侯自勇","id":"c8da92c0-8378-493e-8cc9-bcf1e39e094c","originalAuthorName":"侯自勇"},{"authorName":"许云波","id":"9d4e2e7a-a6b5-4cbc-a8a0-2c4094a52f5a","originalAuthorName":"许云波"},{"authorName":"吴迪","id":"70cfc426-c1fe-4ac6-a9c5-33ec46e2dd57","originalAuthorName":"吴迪"}],"doi":"10.3724/SP.J.1037.2012.00115","fpage":"1057","id":"8baba075-a508-4ed5-80ce-544f6ad8a79e","issue":"9","journal":{"abbrevTitle":"JSXB","coverImgSrc":"journal/img/cover/JSXB.jpg","id":"48","issnPpub":"0412-1961","publisherId":"JSXB","title":"金属学报"},"keywords":[{"id":"4f7127f6-7f9a-4149-bc7c-38af271456b5","keyword":"超低碳钢","originalKeyword":"超低碳钢"},{"id":"867650b8-75c4-4ed2-9032-a4299eaf0662","keyword":"超快速退火","originalKeyword":"超快速退火"},{"id":"11bda9b0-8a3b-4b1c-bb40-e1001d6f1d22","keyword":"再结晶","originalKeyword":"再结晶"},{"id":"8606f060-ef29-4ec3-8a8e-b3ac731463c9","keyword":"组织","originalKeyword":"组织"},{"id":"7c644b68-28d1-4ee9-9794-6caa98c16a8e","keyword":"织构","originalKeyword":"织构"}],"language":"zh","publisherId":"jsxb201209005","title":"超快速退火下超低碳钢的再结晶行为研究","volume":"48","year":"2012"},{"abstractinfo":"用等离子体增强型化学气相沉积先得到非晶硅(a-Si:H)薄膜,再用卤钨灯照射的方法对其进行快速光热退火(RPTA),得到了多晶硅薄膜.然后,进行XRD衍射谱、暗电导率和拉曼光谱等的测量.结果发现,a-Si:H薄膜在RPTA退火中,退火温度在750℃以上,晶化时间需要2min,退火温度在650℃以下,晶化时间则需要2.5h;晶化后,晶粒的优先取向是(111)晶向;退火温度850℃时,得到的晶粒最大,暗电导率也最大;退火温度越高,晶化程度越好;退火时间越长,晶粒尺寸越大;光子激励在RPTA退火中起着重要作用.","authors":[{"authorName":"张宇翔","id":"7f87eb1b-74a5-430d-8b4f-52d6f3f4800f","originalAuthorName":"张宇翔"},{"authorName":"王海燕","id":"e7394e92-36c5-456a-afa2-94b352acf543","originalAuthorName":"王海燕"},{"authorName":"陈永生","id":"14ac1b1b-a598-4f23-b8b2-527e6ca2728f","originalAuthorName":"陈永生"},{"authorName":"杨仕娥","id":"20131cf5-5371-429b-b1bd-171bcd421e9a","originalAuthorName":"杨仕娥"},{"authorName":"郜小勇","id":"f577c145-c318-4ff3-8c9d-7b5166a7074b","originalAuthorName":"郜小勇"},{"authorName":"卢景霄","id":"8b2991a0-acaa-4d8a-90f4-d71a86410d05","originalAuthorName":"卢景霄"},{"authorName":"冯团辉","id":"8afae02d-a689-4baa-b631-bf5793f960fb","originalAuthorName":"冯团辉"},{"authorName":"李瑞","id":"186ea41e-5fe1-427f-a59a-d460ff0e11b8","originalAuthorName":"李瑞"},{"authorName":"郭敏","id":"7d7b80bb-8a18-400f-8f31-86cbd8fb43de","originalAuthorName":"郭敏"}],"doi":"10.3969/j.issn.1000-985X.2005.02.031","fpage":"340","id":"96043623-8a8d-47f1-b84d-6ff92d4e0174","issue":"2","journal":{"abbrevTitle":"RGJTXB","coverImgSrc":"journal/img/cover/RGJTXB.jpg","id":"57","issnPpub":"1000-985X","publisherId":"RGJTXB","title":"人工晶体学报"},"keywords":[{"id":"180ede95-234e-46f2-9c96-a9c19d1e142d","keyword":"多晶硅薄膜","originalKeyword":"多晶硅薄膜"},{"id":"f32ab5f7-0e93-4f35-bbe8-680a2e883020","keyword":"快速光热退火","originalKeyword":"快速光热退火"},{"id":"b742404f-9981-4d23-9176-73218a6043b0","keyword":"固相晶化","originalKeyword":"固相晶化"}],"language":"zh","publisherId":"rgjtxb98200502031","title":"用快速光热退火制备多晶硅薄膜的研究","volume":"34","year":"2005"}],"totalpage":2939,"totalrecord":29385}