Mufu YAN
,
Qingchang MENG
,
Jihong YAN
材料科学技术(英文)
Two materials, pure Fe and pure Al, were nitrided in a pulse plasma nitriding facility. The nitrogen profiles in surface layers and the surface phase structures of specimens nitrided at 500℃ for 8 h for Fe and for 6 h for Al were measured using the glow discharge spectrometry and an X-ray diffractometer, respectively. XRD results indicate that the compound layer with hcp crystal structure (AlN) was formed on the top of Al substrate. During nitriding of Fe, the compound layer growth conforms to parabolic law and the surface nitrogen concentration change little with increasing the nitriding time. The surface nitrogen content of nitrided Al specimens is less than theoretical value 34.17 wt pct of AlN. The mathematical models of nitrogen concentration profiles in the surface layer of nitrided Al specimen have been established based on the research of the kinetics of pulse plasma nitriding of Fe and the nitrogen concentration profiles were also simulated. Results show that the predicted curves agree basically with the experimental data.
关键词:
Pulse plasma nitriding
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,
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白宣羽
,
汪渊
,
徐可为
稀有金属材料与工程
采用磁控溅射方法在Si(111)基片上沉积Cu-Zr/ZrN薄膜体系作为扩散阻挡层.通过比较Cu-Zr/ZrN薄膜体系和三元非晶(Mo,Ta,W)-Si-N的电阻率,同时比较Cu-Zr/ZrN薄膜体系和Ta,YaN的硬度,说明作为扩散阻挡层的材料的选取,应从整体性能上考虑,而不能仅仅考虑热稳定性等单一指标.
关键词:
非晶
,
电阻率
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纳米压入
,
硬度