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Superplastic Properties of Al2O3/Ni-Mn Nanocomposite Fabricated by Electrodeposition

Guofeng Wang Kaifeng Zhang

材料科学技术(英)

Ni-Mn nanocomposite reinforced by Al2O3 particles was fabricated by pulse electrodeposition. The average grain size is 60 nm and the content of Mn and Al2O3 particles is 0.3 and 0.6 wt pct, respectively. The superplastic deformation behavior was further studied at the temperatures ranging from 673 to 873 K. A maximum elongation of 530% is obtained in the tension test at a temperature of 773 K and at a strain rate of 1.67×10-3 s-1. The curves of the flow stress vs strain rate have features similar to the trend of conventional superplastic materials. The test temperature (773 K) equals to 0.35Tm, which means the material obtains low temperature superplasticity. The microstructures of the composite were examined and grain growth was observed during deformation.

关键词: Electrodeposition , 纳米复合材料 , 低温超塑性 , 显微组织

X-ray and Magnetoresistance Measurements of Electrodeposited Cu-Co Granular Films

Suwei YAO , Haixia WU , Weiguo ZHANG , Hongzhi WANG

材料科学技术(英)

Granular CoxCu1-x alloy films were prepared by electrodeposition at room temperature directly onto semiconducting Si substrate. X-ray diffraction (XRD) revealed that the as-deposited films formed single phase metastable fcc alloy structure. The fcc lattice parameter α was found to decrease linearly with increasing Co concentration x in the studied range. The giant magnetoresistance (GMR) of the films was improved after annealing. Pure Co fcc diffraction peaks were observed in the diffractogram of the annealed sample, indicating phase separation occurred upon annealing. The optimal annealing temperature was 450℃. The maximum of magnetoresistance (MR) ratio 8.21% was obtained for the Co20Cu80 thin film after annealing at 450℃ for 1 h. The saturation field decreased upon annealing in the MR curves of Co20Cu81 film.

关键词: Electrodeposition , 巨磁电阻 , 电沉积 , 颗粒

Effect of the current density on electrodepositing alpha-lead dioxide coating on aluminum substrate

Buming CHEN , Zhongcheng GUO , Hui HUANG , Xianwan YANG , Yuandong CAO

金属学报(英文版) doi:10.1016/S1006-7191(08)60111-8

The α-PbO2  electrodes are prepared by anodic electrodeposition on A1/conductive coating electrode from alkaline plumbite solutions in order to investigate the effect of the different current densities on the properties of  α-PbO2  electrodes. The physicochemical properties of the  α-PbO2  electrodes are analyzed by using SEM, EDS, XRD, Tafel plot, linear sweep voltammetry (LSV) and A.C. impedance. A compact and uniform layer of lead dioxide was obtained at the current density of 3 mA·cm-2. A further increase in current density results in smaller particles with high porosity. EDS and XRD analyses have shown that the PbO2 deposited in alkaline conditions is highly non stoichiometric, and the PbO impurities are formed on the surface layer besides the α-PbO2 . The corrosion resistance of α-PbO2  at the low current density is superior to that of the high current density. It can be attributed to a porous layer of deposited films at high current densities. When used as anodes for oxygen evolution in aqueous Zn2+ 50~g·L-1, H2SO4 150~g·L-1, the Al/conductive coating/α-PbO2 exhibits lower potential compared to Pb electrode. Al/conductive coating/α-PbO2  electrode with the best electrocatalytic activity was obtained at current density of 1mA·cm-2. The lowest roughness factor was obtained at 1 mA·cm-2.

关键词: Alpha lead dioxide , null , null , null , null

Role of silicon in steels on galvanized coatings

Chunshan CHE , Jintang LU , Gang KONG , Qiaoyu XU

金属学报(英文版) doi:DOI: 10.1016/S1006-7191(08)60

In this article, five kinds of silicon-containing steel sheets have been electrodeposited, and then immersed in a pure molten zinc bath at 450℃ for various periods of time. The results by scanning electron microscopy (SEM) show that the coating of the sample (0.09 wt pct Si) with iron-electrodeposited pretreatment eliminates the reactive zones which are found in the coating without iron-electrodeposited pretreatment. The galvanized sample (0.28 wt pct Si) with iron-electrodeposited pretreatment exhibits a compact and coherent coating. The coating of the sample (0.37 wt pct Si) with the iron-electrodeposited pretreatment experiences a transition from a compact and coherent coating to a reactive one. The energy dispersive spectrum (EDS) results reveal that for the galvanized samples with iron-electrodeposited pretreatment, excessive silicon accumulates on the surface of the substrate due to the low solubility of silicon in the τ, after the iron layer is depleted by the increasing growth of the Fe-Zn intermetallics. With the movement of the substrate/τ interface toward the substrate, silicon-enriched α-Fe peels off from the substrate and breaks into the particles. The particles move toward the δ layer through the τ layer because silicon-enriched α-Fe cannot be absorbed in the τ layer. When the particles reach the δ/τ interface, they are dissolved in the δ layer, making the  τlayer thin or even vanish.

关键词: Zn coating , null , null , null , null

PREPARATION OF TEM THIN FOIL CONTAINING POWDER PARTICLE BY ELECTRODEPOSITION METHOD

S.J. Yan

金属学报(英文版)

A practical technique to prepare transmission electron microscopy (TEM) thin foil containing powder particle was described and the data for the codeposition of two type particles with copper in the electroplating were presented. By depositing the particles which were distributed in CuSO4 electrolyte on cathode together with Cu2+ in electrodeposition bath, composite coating with suitable thickness could be formed. The thin coating was separated from the substrate and cut into a disc with diameter of 3mm for electropolishing. When the Cu matrix was thinned during electropolishing, the particles contained in the coating plate were also thinned to meet the suitable thickness for TEM observation. Various experimental results revealed that during electrodepositing the current density, pH-value of electrolyte and stirring mode all have significant effects on the distribution of particles in composite coating and the surface quality of the composite coating. The proper parameters used during electrodepositing to prepare TEM thin foil containing powder particle were discussed.

关键词: electrodeposition , Powder , particles , TEM , t

在FTO导电玻璃上电化学沉积高效可见光光电化学分解水Cu2O/g-C3N4异质结膜

张声森 , 晏洁 , 杨思源 , 徐悦华 , 蔡欣 , 张向超 , 彭峰 , 方岳平

催化学报 doi:10.1016/S1872-2067(16)62588-3

近几十年来,光电化学分解水制氢作为一种洁净的、能持续利用太阳能的技术受到极大关注.在众多光催化材料中,p型半导体氧化亚铜(Cu2O)被认为是最有前途的可见光光电分解水材料之一.理论上,它的光能转换为氢能的效率可达到18.7%.然而,目前所报道的Cu2O光转换效率远远低于此值;同时,纯Cu2O在光照条件下的稳定性较差.研究表明,Cu2O与其它半导体复合可以增强其光电转换效率和提高稳定性.如Cu2O和能带匹配的石墨相氮化碳(g-C3N4)复合后,光催化性能和稳定性都有较大提高.但目前所报道的Cu2O/g-C3N4复合物几乎都是粉末状催化剂,不便于回收和重复使用.本文首先采用电化学方法在FTO导电玻璃上沉积Cu2O薄膜,采用溶胶凝胶法制备g-C3N4纳米颗粒材料,然后采用电化学法在Cu2O薄膜表面沉积一层g-C3N4纳米颗粒,得到了Cu2O/g-C3N4异质结膜.分别利用X射线粉末衍射(XRD)、高分辨透射电子显微镜(HRTEM)、扫描电子显微镜(SEM)、紫外可见光谱(UV-Vis)和光电化学分解水实验分析了Cu2O/g-C3N4异质结的组成结构、表面形貌、光吸收性能及催化剂活性和稳定性.XRD和HRTEM表征显示,本文成功合成了Cu2O/g-C3N4异质结材料,SEM图表明g-C3N4纳米颗粒在Cu2O表面分布均匀,大小均一.可见光光电化学分解水结果显示,异质结薄膜的光电化学性能比纯的Cu2O和g-C3N4薄膜材料有极大提高.当在Cu2O表面沉积g-C3N4的时间为15 s时,得到样品Cu2O/g-C3N4-15异质结膜,其在–0.4 V和可见光照射条件下,光电流密度达到了–1.38 mA/cm2,分别是纯Cu2O和g-C3N4薄膜材料的19.7和6.3倍.产氢速率也达到了0.48 mL h–1 cm–2,且产氢和产氧的速率之比约为2,说明此异质结材料在可见光作用下能全分解水.经过三次循环实验,光电化学分解水的效率仅降低10.8%,表明该材料具有良好的稳定性.根据UV-Vis表征和光电化学性能对比,Cu2O/g-C3N4-15的光电性能最好,但其光吸收性能并不是最好,说明光电化学性能与光吸收不是成正比关系,主要是由于Cu2O和g-C3N4两个半导体相互起到了协同作用.机理分析表明,Cu2O/g-C3N4异质结薄膜在光照下,由于两者能带匹配,Cu2O的光生电子从其导带转移到g-C3N4的导带上,g-C3N4价带上的空隙转移到Cu2O的价带上,从而降低了光生电子和空隙的复合,提高了其光催化性能.由于g-C3N4的导带位置高于H2O(或H+)还原为H2的电势,Cu2O的价带位置低于H2O(或OH–)还原为O2的电势,所以在外加–0.4 V偏压和可见光照射条件下,Cu2O/g-C3N4能全分解水,光生载流子越多,光电化学分解水的速率越大.综上所述,在Cu2O薄膜上沉积g-C3N4后得到的异质结薄膜具有高效的光能转换为氢能性能.

关键词: 氧化亚铜 , 石墨化氮化碳 , 异质结薄膜 , 电化学沉积 , 可见光 , 光电化学分解水 , 产氢

Cr,Al 颗粒尺寸对Ni-Cr-Al复合镀层氧化行为的影响

杨秀英 , 赵艳红 , 彭晓 , 王福会

中国腐蚀与防护学报

分别用纳米颗粒Cr (平均尺寸62 nm), Al(平均尺寸85 nm)和微米颗粒Cr 和Al(平均尺寸3 μm)复合电沉积制备Ni-11Cr-3Al纳米复合镀层(ENC)和Ni-11Cr-7Al微米复合镀层(EMC)。纳米颗粒的复合使ENC Ni-11Cr-3Al比EMC Ni-11Cr-7Al的颗粒分布更加均匀,颗粒间距减小近25倍。900℃, 24 h恒温氧化实验表明,ENC Ni-11Cr-3Al与EMC Ni-11Cr-7Al相比氧化速率显著降低。这是由于其快速形成一层连续、致密的Cr2O3膜,进而促进其下Al2O3膜的快速形成所致。

关键词: 电沉积 , Ni-Cr-Al , nanocomposite , particle size effect , oxidation

掺杂钨丝电沉积铬的工艺研究

严敏杰

表面技术 doi:10.3969/j.issn.1001-3660.2009.06.019

为了研究掺杂钨丝(真空镀铬加热元件)表面电解沉积一定厚度(≥100μm)金属铬的工艺,详细考察了不同温度、电流密度、沉积时间等对镀层的影响,并对镀层进行了性能测试.结果表明,最佳工艺条件为:铬酐150~180g/L,硫酸1.5~1.8g/L,稀土(La~(3+))添加剂0.5~1.5g/L,温度为55℃,电流密度为8~10A/dm~2,电镀时间3h.此工艺条件下所得镀层光亮,色泽好,厚度可达100μm,且镀层耐蚀性好,结合力高.

关键词: 电沉积 , , 掺杂钨丝 , 工艺参数 , 耐蚀性 , CASS试验

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