{"currentpage":1,"firstResult":0,"maxresult":10,"pagecode":5,"pageindex":{"endPagecode":5,"startPagecode":1},"records":[{"abstractinfo":"采用磁控溅射方法在1Cr18Ni9<span style=\"color:red\">Ti</span>不锈钢基体上沉积<span style=\"color:red\">Ti-Si-N</span><span style=\"color:red\">纳米</span><span style=\"color:red\">薄膜</span>.结果发现:随着<span style=\"color:red\">Si</span>含量增加,<span style=\"color:red\">薄膜</span>的晶粒尺寸逐渐变小,晶粒尺寸范围在3 nm～20 nm之间.<span style=\"color:red\">薄膜</span>的显微硬度相对于TiN有明显增加,最大硬度可达43.5GPa.<span style=\"color:red\">Si</span>元素的加入亦改善了膜基结合强度.同时发现,<span style=\"color:red\">Ti-Si-N</span><span style=\"color:red\">纳米</span><span style=\"color:red\">薄膜</span>的摩擦系数和比磨损率随着<span style=\"color:red\">Si</span>含量的增加先减小后增加,其高温摩擦系数明显低于常温,但比磨损率却有显著提高.","authors":[{"authorName":"牛新平","id":"89782c82-76ca-49fe-86a5-0aa1bd3f041e","originalAuthorName":"牛新平"},{"authorName":"王昕","id":"d7781976-306e-4b3d-87a2-bda47e77f39a","originalAuthorName":"王昕"},{"authorName":"马胜利","id":"133c6b34-508e-4f33-92c3-ce894f7f4f7a","originalAuthorName":"马胜利"},{"authorName":"徐可为","id":"403e92a4-8c11-4c89-b819-2ecdf7fe6164","originalAuthorName":"徐可为"},{"authorName":"刘维民","id":"e7b31a6d-1a6a-42dc-8a05-80f3d7156b58","originalAuthorName":"刘维民"}],"doi":"","fpage":"1882","id":"e70c4fc6-af69-453f-adaf-2c992a986237","issue":"12","journal":{"abbrevTitle":"XYJSCLYGC","coverImgSrc":"journal/img/cover/XYJSCLYGC.jpg","id":"69","issnPpub":"1002-185X","publisherId":"XYJSCLYGC","title":"稀有金属材料与工程"},"keywords":[{"id":"957f6882-ea75-44c0-acf5-df7bdacfbae2","keyword":"<span style=\"color:red\">Ti-Si-N</span><span style=\"color:red\">纳米</span><span style=\"color:red\">薄膜</span>","originalKeyword":"Ti-Si-N纳米薄膜"},{"id":"d862aa15-8257-4c09-9cf5-4df6e00d4eff","keyword":"显微硬度","originalKeyword":"显微硬度"},{"id":"1b3be6ba-da1d-47a0-9cd4-a650990cb3e3","keyword":"结合强度","originalKeyword":"结合强度"},{"id":"84fe8162-10e4-4fb0-8166-349306927df9","keyword":"摩擦系数","originalKeyword":"摩擦系数"}],"language":"zh","publisherId":"xyjsclygc200512009","title":"磁控溅射制备<span style=\"color:red\">Ti-Si-N</span><span style=\"color:red\">纳米</span><span style=\"color:red\">薄膜</span>的摩擦磨损性能","volume":"34","year":"2005"},{"abstractinfo":"综述了<span style=\"color:red\">Ti-Si-N</span>超硬<span style=\"color:red\">纳米</span>复合<span style=\"color:red\">薄膜</span>结构形式的研究进展.介绍了研究者对<span style=\"color:red\">Si</span>原子在<span style=\"color:red\">Ti-Si-N</span>中形成的晶界是否为晶态的认识与研究,阐述了<span style=\"color:red\">Si</span>原子在<span style=\"color:red\">Ti-Si-N</span>中所形成的界面结构形式的研究现状以及<span style=\"color:red\">Ti-Si-N</span><span style=\"color:red\">薄膜</span>沉积过程中的形成机制,并展望了<span style=\"color:red\">Ti-Si-N</span>超硬<span style=\"color:red\">纳米</span>复合<span style=\"color:red\">薄膜</span>今后的研究方向.","authors":[{"authorName":"任元","id":"f8f786c5-1e21-42d0-ba79-4c4abaa0aafc","originalAuthorName":"任元"},{"authorName":"刘学杰","id":"81968326-4360-46b2-9d9b-66e9bc721881","originalAuthorName":"刘学杰"},{"authorName":"谭心","id":"4cc2e2c1-6e47-41b3-a195-f2dd83a58fc5","originalAuthorName":"谭心"},{"authorName":"郭金鸽","id":"c08f6cc2-63d2-4893-814a-3834403c715d","originalAuthorName":"郭金鸽"},{"authorName":"孙士阳","id":"d3fae3f8-ab96-4100-a46e-572560bdfd62","originalAuthorName":"孙士阳"}],"doi":"","fpage":"94","id":"f9a1d60f-6a2c-43ee-a51b-bbb456a0a8c7","issue":"z1","journal":{"abbrevTitle":"CLDB","coverImgSrc":"journal/img/cover/CLDB.jpg","id":"8","issnPpub":"1005-023X","publisherId":"CLDB","title":"材料导报"},"keywords":[{"id":"99a7ab06-88f2-4a33-8b9c-05033144bce0","keyword":"<span style=\"color:red\">Ti-Si-N</span><span style=\"color:red\">薄膜</span>","originalKeyword":"Ti-Si-N薄膜"},{"id":"d04ed00c-a57f-4a0a-bd4b-bebda8079b75","keyword":"<span style=\"color:red\">纳米</span>复合结构","originalKeyword":"纳米复合结构"},{"id":"8476c2b8-84b1-40dd-bd23-f96b85ec65e0","keyword":"界面结构","originalKeyword":"界面结构"}],"language":"zh","publisherId":"cldb2012z1025","title":"超高硬度<span style=\"color:red\">纳米</span>复合<span style=\"color:red\">薄膜</span><span style=\"color:red\">Ti-Si-N</span>结构的研究进展","volume":"26","year":"2012"},{"abstractinfo":"用工业型脉冲直流等离子体增强化学气相沉积技术,在高速钢(W18Cr4V)表面沉积了<span style=\"color:red\">Ti-Si-N</span>复合<span style=\"color:red\">薄膜</span>,研究了<span style=\"color:red\">Ti-Si-N</span>复合<span style=\"color:red\">薄膜</span>的微观组织和力学性能.结果显示,<span style=\"color:red\">薄膜</span>相结构为<span style=\"color:red\">纳米</span>晶TiN和<span style=\"color:red\">纳米</span>晶或非晶TiSi2以及非晶相<span style=\"color:red\">Si3N</span>4;在<span style=\"color:red\">Si</span>含量为5.0 at%～28.0 at%范围内,<span style=\"color:red\">薄膜</span>的晶粒尺寸逐渐变大;<span style=\"color:red\">Ti-Si-N</span><span style=\"color:red\">薄膜</span>的显微硬度相对于TiN有明显增加,最高硬度可达40 GPa;高温退火后,<span style=\"color:red\">Ti-Si-N</span><span style=\"color:red\">纳米</span>复合<span style=\"color:red\">薄膜</span>的显微硬度与晶粒尺寸在800℃高温下仍然保持稳定.","authors":[{"authorName":"牛新平","id":"75b802b5-7298-4bf2-a385-8fd5fe8cff9c","originalAuthorName":"牛新平"},{"authorName":"马大衍","id":"67b600a8-4116-40b6-bf64-07278b07dca9","originalAuthorName":"马大衍"},{"authorName":"马胜利","id":"ca241e64-b783-4af5-aec8-267ad14b53e0","originalAuthorName":"马胜利"},{"authorName":"徐可为","id":"7ac4d569-d792-46bf-abfc-19ba7d926926","originalAuthorName":"徐可为"}],"doi":"","fpage":"1751","id":"b9f98ff0-d458-4104-bcd5-c7d762c0a179","issue":"11","journal":{"abbrevTitle":"XYJSCLYGC","coverImgSrc":"journal/img/cover/XYJSCLYGC.jpg","id":"69","issnPpub":"1002-185X","publisherId":"XYJSCLYGC","title":"稀有金属材料与工程"},"keywords":[{"id":"21e806bc-fa1f-4624-aae6-f6f0b893c555","keyword":"<span style=\"color:red\">Ti-Si-N</span>","originalKeyword":"Ti-Si-N"},{"id":"cdc3c095-69c7-4774-adef-08ae0a56d30e","keyword":"<span style=\"color:red\">纳米</span>复合<span style=\"color:red\">薄膜</span>","originalKeyword":"纳米复合薄膜"},{"id":"129f9000-7983-4b32-b39a-dc7089d638bc","keyword":"晶粒尺寸","originalKeyword":"晶粒尺寸"},{"id":"9584f3c9-3862-478e-a191-40df50d563cb","keyword":"显微硬度","originalKeyword":"显微硬度"}],"language":"zh","publisherId":"xyjsclygc200511017","title":"<span style=\"color:red\">Ti-Si-N</span><span style=\"color:red\">纳米</span>复合<span style=\"color:red\">薄膜</span>的结构与性能","volume":"34","year":"2005"},{"abstractinfo":"用脉冲直流等离子体增强化学气相沉积(PCVD)方法在高速钢(HSS)基体上制备了<span style=\"color:red\">Ti-Si-N</span><span style=\"color:red\">薄膜</span>,重点从不同温度退火后<span style=\"color:red\">薄膜</span>相结构、晶粒尺寸和显微硬度的变化等方面,探讨了不同<span style=\"color:red\">Si</span>含量的<span style=\"color:red\">Ti-Si-N</span><span style=\"color:red\">薄膜</span>的高温热稳定性.结果表明:<span style=\"color:red\">Ti-Si-N</span><span style=\"color:red\">薄膜</span>在900℃以内退火处理后,晶粒尺寸和显微硬度并无明显突变,尤其是<span style=\"color:red\">Si</span>含量较低时,在800℃,晶粒尺寸和显微硬度几乎没有变化,表明<span style=\"color:red\">Ti-Si-N</span><span style=\"color:red\">薄膜</span>具有非常良好的高温热稳定性,这可能与<span style=\"color:red\">薄膜</span>相形成在高温下仍为调幅分解有关.","authors":[{"authorName":"徐建华","id":"ac222343-570e-4839-aa19-db592fc58327","originalAuthorName":"徐建华"},{"authorName":"马大衍","id":"416243cb-a3de-41ea-9d2f-da5157564be8","originalAuthorName":"马大衍"},{"authorName":"马胜利","id":"ef6967b5-5285-44b7-97eb-5e21e4e0a8f0","originalAuthorName":"马胜利"},{"authorName":"徐可为","id":"587dce58-8f8f-4c40-8060-af3649bbac81","originalAuthorName":"徐可为"}],"doi":"","fpage":"1778","id":"a56ae960-68cd-4eba-9011-9b1018507cc0","issue":"11","journal":{"abbrevTitle":"XYJSCLYGC","coverImgSrc":"journal/img/cover/XYJSCLYGC.jpg","id":"69","issnPpub":"1002-185X","publisherId":"XYJSCLYGC","title":"稀有金属材料与工程"},"keywords":[{"id":"e0137792-4e56-4b36-829a-d107727578c9","keyword":"等离子体增强化学气相沉积(PCVD)","originalKeyword":"等离子体增强化学气相沉积(PCVD)"},{"id":"a043dd64-910b-463e-9584-aab9764c7206","keyword":"<span style=\"color:red\">Ti-Si-N</span><span style=\"color:red\">薄膜</span>","originalKeyword":"Ti-Si-N薄膜"},{"id":"57f33b2b-42e8-4b7a-82e7-0f4a281d9e54","keyword":"微观结构,高温热稳定性","originalKeyword":"微观结构,高温热稳定性"}],"language":"zh","publisherId":"xyjsclygc200511024","title":"<span style=\"color:red\">Ti-Si-N</span><span style=\"color:red\">纳米</span>复合超硬<span style=\"color:red\">薄膜</span>的高温热稳定性","volume":"34","year":"2005"},{"abstractinfo":"用直流等离子体增强化学气相沉积(PCVD)方法在不锈钢基体上制备了<span style=\"color:red\">Ti-Si-N</span>硬质<span style=\"color:red\">纳米</span>复合<span style=\"color:red\">薄膜</span>,研究了<span style=\"color:red\">Si</span>含量对<span style=\"color:red\">薄膜</span>硬度的影响及高温退火对<span style=\"color:red\">薄膜</span>晶粒尺寸及其硬度的影响.结果表明:<span style=\"color:red\">薄膜</span>的硬度随着<span style=\"color:red\">Si</span>含量的增加有先增大后减小的趋势,最大硬度可达70 GPa以上.<span style=\"color:red\">薄膜</span>表现出了较高的热稳定性能,对于晶粒尺寸在4 nm以下的<span style=\"color:red\">薄膜</span>,<span style=\"color:red\">Ti-Si-N</span><span style=\"color:red\">薄膜</span>的<span style=\"color:red\">纳米</span>结构和硬度可以维持在1000℃以上.沉积态<span style=\"color:red\">薄膜</span>的晶粒尺寸是影响<span style=\"color:red\">薄膜</span>再结晶温度的主要因素.<span style=\"color:red\">薄膜</span>的高热稳定性是由于沉积过程中发生的自发调幅分解形成了<span style=\"color:red\">纳米</span>复合结构,偏析使得<span style=\"color:red\">纳米</span>晶晶界具有强的热力学稳定性.","authors":[{"authorName":"马大衍","id":"daf8f72b-dddd-4e5e-98b5-2a0c2d00f068","originalAuthorName":"马大衍"},{"authorName":"马胜利","id":"d23937f9-fa23-4d28-81cc-545711b2aa75","originalAuthorName":"马胜利"},{"authorName":"徐可为","id":"2e278e1c-94cc-4c51-ab58-8d5cb7b04bf3","originalAuthorName":"徐可为"},{"authorName":"S.Veprek","id":"ff44c10f-76ec-4099-99a1-745fe550b559","originalAuthorName":"S.Veprek"}],"doi":"10.3321/j.issn:1005-3093.2004.06.010","fpage":"617","id":"b935dce3-914c-48f8-b2d1-87dbb287fc4a","issue":"6","journal":{"abbrevTitle":"CLYJXB","coverImgSrc":"journal/img/cover/CLYJXB.jpg","id":"16","issnPpub":"1005-3093","publisherId":"CLYJXB","title":"材料研究学报"},"keywords":[{"id":"62841368-a287-4fc9-adbe-67629e5e672b","keyword":"无机非金属材料","originalKeyword":"无机非金属材料"},{"id":"157bed19-492f-430d-8565-5d2e44b6ed76","keyword":"<span style=\"color:red\">纳米</span><span style=\"color:red\">薄膜</span>","originalKeyword":"纳米薄膜"},{"id":"4b480309-14bd-44f0-96ad-3334ad6e060d","keyword":"PCVD","originalKeyword":"PCVD"},{"id":"7305b57d-e180-4bab-b7bc-2d65dfa70199","keyword":"硬度","originalKeyword":"硬度"},{"id":"0e2d30e0-db43-4c1a-a696-3d587e469c4d","keyword":"热稳定性","originalKeyword":"热稳定性"}],"language":"zh","publisherId":"clyjxb200406010","title":"<span style=\"color:red\">纳米</span><span style=\"color:red\">Ti-Si-N</span><span style=\"color:red\">薄膜</span>的高温热稳定性","volume":"18","year":"2004"},{"abstractinfo":"用反应磁控溅射方法,在不锈钢表面沉积<span style=\"color:red\">Ti-Si-N</span><span style=\"color:red\">薄膜</span>.用原子力显微镜观察<span style=\"color:red\">薄膜</span>的表面形貌,<span style=\"color:red\">Ti-Si-N</span>颗粒尺寸小于0.1 μm,用亚微压入仪测试<span style=\"color:red\">薄膜</span>硬度,当硅的摩尔分数为9.6%时,<span style=\"color:red\">薄膜</span>硬度出现最大值47 GPa.球-盘式摩擦磨损结果表明,<span style=\"color:red\">Ti-Si-N</span><span style=\"color:red\">薄膜</span>的耐磨性能明显优于TiN<span style=\"color:red\">薄膜</span>,加入少量硅元素后,TiN<span style=\"color:red\">薄膜</span>的抗磨损性能有显著提高,但<span style=\"color:red\">Ti-Si-N</span><span style=\"color:red\">薄膜</span>的室温摩擦系数较高(0.6～0.8),高温下摩擦系数也仅轻微降低(550℃,0.5～0.6).由于<span style=\"color:red\">Ti-Si-N</span><span style=\"color:red\">薄膜</span>的摩擦系数可能与磨损中氧化物生成量的增加有关,常温下<span style=\"color:red\">Ti-Si-N</span><span style=\"color:red\">薄膜</span>的摩擦系数随硅摩尔分数的增加而增大,而高温下<span style=\"color:red\">Ti-Si-N</span><span style=\"color:red\">薄膜</span>的摩擦系数随硅含量上升而降低.","authors":[{"authorName":"马大衍","id":"43b0d856-af66-404a-a676-40e4117645f4","originalAuthorName":"马大衍"},{"authorName":"马胜利","id":"292d3e93-b67d-4b63-bb34-13b438e9a2ab","originalAuthorName":"马胜利"},{"authorName":"徐可为","id":"628d2b06-779f-4a2f-b975-6e8b1097f32f","originalAuthorName":"徐可为"},{"authorName":"","id":"d2efb3a5-9bb1-42b9-ba43-954e5cf57ef2","originalAuthorName":""}],"doi":"","fpage":"1308","id":"46f174de-abbb-4bee-a418-9fbe0b8e27d8","issue":"8","journal":{"abbrevTitle":"ZGYSJSXB","coverImgSrc":"journal/img/cover/ZGYSJSXB.jpg","id":"88","issnPpub":"1004-0609","publisherId":"ZGYSJSXB","title":"中国有色金属学报"},"keywords":[{"id":"6becc2c5-2081-4761-bfba-0a69f93c7462","keyword":"<span style=\"color:red\">Ti-Si-N</span><span style=\"color:red\">薄膜</span>","originalKeyword":"Ti-Si-N薄膜"},{"id":"5fce430e-7d1a-4267-be1c-eac078d3b248","keyword":"反应磁控溅射","originalKeyword":"反应磁控溅射"},{"id":"656bd6c7-98df-4b97-80e6-d278d757afe1","keyword":"摩擦学","originalKeyword":"摩擦学"}],"language":"zh","publisherId":"zgysjsxb200408009","title":"反应磁控溅射制备<span style=\"color:red\">Ti-Si-N</span><span style=\"color:red\">薄膜</span>的摩擦磨损性能","volume":"14","year":"2004"},{"abstractinfo":"为了准确地实现<span style=\"color:red\">Ti-Si-N</span><span style=\"color:red\">纳米</span>复合<span style=\"color:red\">薄膜</span>生长过程动力学蒙特卡罗(KMC)仿真,采用简单原子之间的有效势拟合了第一性原理计算单粒子在TiN(001)表面的吸附作用和迁移行为.通过计算分别获得<span style=\"color:red\">Ti</span>、<span style=\"color:red\">Si</span>、<span style=\"color:red\">N</span>单粒子沉积在TiN(001)表面有效势的计算参数a、r0和u0.<span style=\"color:red\">Ti</span>、<span style=\"color:red\">Si</span>、<span style=\"color:red\">N</span>单粒子在TiN(001)表面吸附能和迁移激活能拟合相对误差均小于5％,<span style=\"color:red\">Ti</span>、<span style=\"color:red\">Si</span>、<span style=\"color:red\">N</span>单粒子在TiN(001)表面绕2<span style=\"color:red\">N2Ti</span>岛迁移激活能相对误差小于10％.对势Morse势可以描述简单键性的作用力,对于较复杂的键性其计算原子之间相互作用的准确度降低.","authors":[{"authorName":"刘学杰","id":"4a6d2fb8-ab63-433d-874b-ffa3a1456256","originalAuthorName":"刘学杰"},{"authorName":"任元","id":"9757f286-6b29-43a5-9d02-6da6cb1cb1f0","originalAuthorName":"任元"},{"authorName":"孙士阳","id":"f5c488ad-1519-40f2-a051-8e4900195fc4","originalAuthorName":"孙士阳"},{"authorName":"谭心","id":"70f22521-715a-4ca9-8c14-d738d7fdf711","originalAuthorName":"谭心"},{"authorName":"贾慧灵","id":"b7bf8b20-86d9-4e93-b28b-66205ca3f687","originalAuthorName":"贾慧灵"}],"doi":"","fpage":"149","id":"cdba20c4-316e-4998-b2b1-cf8253b23784","issue":"20","journal":{"abbrevTitle":"CLDB","coverImgSrc":"journal/img/cover/CLDB.jpg","id":"8","issnPpub":"1005-023X","publisherId":"CLDB","title":"材料导报"},"keywords":[{"id":"b0e6757d-3ce1-4c32-b6c6-ef0e377a8057","keyword":"复合材料","originalKeyword":"复合材料"},{"id":"f70ef7ed-3936-4534-8ba2-2a708ed8a3ae","keyword":"有效作用势","originalKeyword":"有效作用势"},{"id":"df5053ca-101f-45dc-a709-190b2f2f0dfa","keyword":"<span style=\"color:red\">Ti-Si-N</span><span style=\"color:red\">薄膜</span>","originalKeyword":"Ti-Si-N薄膜"},{"id":"8ba394d4-0dc6-45bd-993e-346a50f29ea5","keyword":"势能面","originalKeyword":"势能面"},{"id":"f4065c41-ee4b-4281-bc53-0b00f2e6d215","keyword":"拟合","originalKeyword":"拟合"}],"language":"zh","publisherId":"cldb201120039","title":"<span style=\"color:red\">Ti-Si-N</span><span style=\"color:red\">纳米</span>复合<span style=\"color:red\">薄膜</span>KMC仿真中有效作用势的拟合","volume":"25","year":"2011"},{"abstractinfo":"用工业型脉冲直流等离子体增强化池气相沉积(PCVD)设备, 在高速钢(W18Cr4V)表面沉积<span style=\"color:red\">Ti-Si-N</span>三元<span style=\"color:red\">薄膜</span>, 研究了不同<span style=\"color:red\">N</span>2流量对<span style=\"color:red\">薄膜</span>组织及性能的影响. 结果表明: 随<span style=\"color:red\">N</span>2流量增大, 膜层沉积速率及膜层中<span style=\"color:red\">Si</span>含量减少, <span style=\"color:red\">薄膜</span>组织趋于致密, 膜层颗粒尺寸明显减小, 划痕法临界载荷和显微硬度显著增加, 硬度最高可达50 GPa以上. 研究发现, 对应<span style=\"color:red\">N</span>2流量, <span style=\"color:red\">薄膜</span>相组成发生变化, 依次存在有TiN/a-<span style=\"color:red\">Si3N</span>4/<span style=\"color:red\">Si</span>, TiN/a-<span style=\"color:red\">Si3N</span>4/TiSi2/<span style=\"color:red\">Si</span>, TiN/a-<span style=\"color:red\">Si3N</span>4/TiSi2三种相组成形式. 分析认为, 低<span style=\"color:red\">N</span>2或高<span style=\"color:red\">Si</span>效果不佳的原因在于直流PCVD 是以工件为阴极, 膜层中过多的<span style=\"color:red\">Si3N</span>4和<span style=\"color:red\">Si</span>将严重劣化阴极的电导性, 致使膜层疏松, 说明脉冲直流PCVD与射频PCVD存在很大的区别.","authors":[{"authorName":"马大衍","id":"63ee78fb-7567-4cb3-b022-2a314698ce78","originalAuthorName":"马大衍"},{"authorName":"王昕","id":"2f12ff6b-d596-4abd-bbd2-dc9cfb21794e","originalAuthorName":"王昕"},{"authorName":"马胜利","id":"9542ae49-e29e-4c16-9ef0-1aa8fdaab40e","originalAuthorName":"马胜利"},{"authorName":"徐可为","id":"00517d1c-a2c4-4536-a274-42d2eec0d195","originalAuthorName":"徐可为"}],"categoryName":"|","doi":"","fpage":"1047","id":"6b44b7d0-b6d2-434e-b4bc-a6c27bb1546a","issue":"10","journal":{"abbrevTitle":"JSXB","coverImgSrc":"journal/img/cover/JSXB.jpg","id":"48","issnPpub":"0412-1961","publisherId":"JSXB","title":"金属学报"},"keywords":[{"id":"8aeadd50-0664-43a3-ba7e-caf50b0b30ec","keyword":"PCVD","originalKeyword":"PCVD"},{"id":"cd9dd55d-f6dc-4a19-b6c5-3a23ee147b89","keyword":"null","originalKeyword":"null"},{"id":"264c82d9-c77e-4a54-94fe-0e623e93b9ca","keyword":"null","originalKeyword":"null"},{"id":"daef8802-142f-4b98-ae2c-8a0e7eb5da3a","keyword":"null","originalKeyword":"null"}],"language":"zh","publisherId":"0412-1961_2003_10_5","title":"<span style=\"color:red\">Ti-Si-N</span><span style=\"color:red\">纳米</span>复相<span style=\"color:red\">薄膜</span>及<span style=\"color:red\">Si</span>含量对脉冲直流PCVD镀膜质量的影响","volume":"39","year":"2003"},{"abstractinfo":"用工业型脉冲直流等离子体增强化学气相沉积(PCVD)设备,在高速钢(W18Cr4V)表面沉积<span style=\"color:red\">Ti-Si-N</span>三元<span style=\"color:red\">薄膜</span>,研究了不同<span style=\"color:red\">N</span>2流量对<span style=\"color:red\">薄膜</span>组织及性能的影响.结果表明:随<span style=\"color:red\">N</span>2流量增大,膜层沉积速率及膜层中<span style=\"color:red\">Si</span>含量减少,<span style=\"color:red\">薄膜</span>组织趋于致密,膜层颗粒尺寸明显减小,划痕法临界载荷和显微硬度显著增加,硬度最高可达50 GPa以上.研究发现,对应<span style=\"color:red\">N</span>2流量,<span style=\"color:red\">薄膜</span>相组成发生变化,依次存在有TiN/a-<span style=\"color:red\">Si3N</span>4/<span style=\"color:red\">Si</span>,TiN/a-<span style=\"color:red\">Si3N</span>4/TiSi2/<span style=\"color:red\">Si</span>,TiN/a-<span style=\"color:red\">Si3N</span>4/TiSi2三种相组成形式.分析认为,低<span style=\"color:red\">N</span>2或高<span style=\"color:red\">Si</span>效果不佳的原因在于直流PCVD是以工件为阴极,膜层中过多的<span style=\"color:red\">Si3N</span>4和<span style=\"color:red\">Si</span>将严重劣化阴极的电导性,致使膜层疏松,说明脉冲直流PCVD与射频PCVD存在很大的区别.","authors":[{"authorName":"马大衍","id":"b5b58c3b-3e2a-48b8-9f49-1904697349bd","originalAuthorName":"马大衍"},{"authorName":"王昕","id":"da367403-9cb7-4ff5-890a-3acaae92b03a","originalAuthorName":"王昕"},{"authorName":"马胜利","id":"2d4e42e6-80ae-4a8c-a8aa-62f667d92d24","originalAuthorName":"马胜利"},{"authorName":"徐可为","id":"760556c9-2fc8-4347-90f2-e58640c1c4ab","originalAuthorName":"徐可为"}],"doi":"10.3321/j.issn:0412-1961.2003.10.007","fpage":"1047","id":"1a6e8fea-2025-446e-bf88-1d189bbeeaf9","issue":"10","journal":{"abbrevTitle":"JSXB","coverImgSrc":"journal/img/cover/JSXB.jpg","id":"48","issnPpub":"0412-1961","publisherId":"JSXB","title":"金属学报"},"keywords":[{"id":"598ab089-6c19-479f-ae2c-02cf570b0133","keyword":"PCVD","originalKeyword":"PCVD"},{"id":"3f1e57d2-67ba-4385-b4c9-e9d0e806bdf1","keyword":"<span style=\"color:red\">Ti-Si-N</span>","originalKeyword":"Ti-Si-N"},{"id":"801f4096-b6b7-4177-8b6f-b6332cab8fe9","keyword":"相组成","originalKeyword":"相组成"},{"id":"c78b8b90-9f99-45e8-a894-94b548cdcb4c","keyword":"临界载荷","originalKeyword":"临界载荷"}],"language":"zh","publisherId":"jsxb200310007","title":"<span style=\"color:red\">Ti-Si-N</span><span style=\"color:red\">纳米</span>复相<span style=\"color:red\">薄膜</span>及<span style=\"color:red\">Si</span>含量对脉冲直流PCVD镀膜质量的影响","volume":"39","year":"2003"},{"abstractinfo":"用脉冲直流等离子体辅助化学气相沉积(PCVD)技术在盲孔的底部获得<span style=\"color:red\">Ti-Si-N</span><span style=\"color:red\">薄膜</span>.用扫描电子显微镜(SEM),X射线能量色散谱仪(EDX),X射线衍射仪(XRD),球痕法(ball-crater),显微硬度计(Hv)和涂层压入仪(Pc)分析不同盲孔深度处<span style=\"color:red\">薄膜</span>的微观结构和力学性能.结果表明,随着盲孔深度的增加,<span style=\"color:red\">Ti-Si-N</span><span style=\"color:red\">薄膜</span>中<span style=\"color:red\">Ti</span>与<span style=\"color:red\">Si</span>元素相对比例降低,<span style=\"color:red\">薄膜</span>厚度下降,<span style=\"color:red\">薄膜</span>与基体的结合强度有很大提高,膜基复合显微硬度下降,而<span style=\"color:red\">薄膜</span>的本征硬度在盲孔深度为20 mm处出现最大值.","authors":[{"authorName":"马青松","id":"90ee3f17-5078-4d7f-83c1-4dbc6ce22981","originalAuthorName":"马青松"},{"authorName":"马胜利","id":"bebaca6f-fd6b-4441-8490-7c6706187cbc","originalAuthorName":"马胜利"},{"authorName":"徐可为","id":"1e225bea-7572-43f2-88bf-f4919a740d78","originalAuthorName":"徐可为"}],"doi":"","fpage":"738","id":"edc4c370-a673-4c73-942c-e8b866bd06d3","issue":"5","journal":{"abbrevTitle":"XYJSCLYGC","coverImgSrc":"journal/img/cover/XYJSCLYGC.jpg","id":"69","issnPpub":"1002-185X","publisherId":"XYJSCLYGC","title":"稀有金属材料与工程"},"keywords":[{"id":"4c2ef88a-dabe-4a33-b0c1-cd4895a43788","keyword":"脉冲直流PCVD","originalKeyword":"脉冲直流PCVD"},{"id":"1ef36a66-f6de-4488-b75f-d2f466e6f013","keyword":"<span style=\"color:red\">Ti-Si-N</span>","originalKeyword":"Ti-Si-N"},{"id":"182d818f-e414-4c76-8918-0d243b81d7da","keyword":"复杂型腔","originalKeyword":"复杂型腔"}],"language":"zh","publisherId":"xyjsclygc200505017","title":"脉冲直流PCVD技术在盲孔底部沉积<span style=\"color:red\">Ti-Si-N</span><span style=\"color:red\">薄膜</span>","volume":"34","year":"2005"}],"totalpage":6016,"totalrecord":60151}