{"currentpage":1,"firstResult":0,"maxresult":10,"pagecode":5,"pageindex":{"endPagecode":5,"startPagecode":1},"records":[{"abstractinfo":"采用SEM和XRD法,分析了磁控溅射CrTiAlN梯度镀层的表面与断口形貌及其相组成随加热温度的变化规律.研究表明:CrTiAlN镀层在600℃之前物相和组织结构保持稳定,随后的升温过程中有相变行为,随着温度的升高,物相由以致密的非晶态物质为主,依次出现CrN、Cr2O3相和AlN等物相;相变的发生有利于镀层保持高温硬度和结合力.加热至900℃时,尽管在镀层表面观察到微区融化现象,但膜基结合紧密;加热至1100℃时镀层表面出现开裂并伴有剥落现象.从温度对镀层的氧化形貌及物相、组织转变机理分析,CrTiAlN梯度镀层在≤900℃时有良好的热稳定性.","authors":[{"authorName":"白力静","id":"6bb649b1-a580-4256-a905-2373b06f2f59","originalAuthorName":"白力静"},{"authorName":"蒋百灵","id":"6755bebf-5204-4a13-9420-d00dc2612de2","originalAuthorName":"蒋百灵"},{"authorName":"<span style=\"color:red\">文</span><span style=\"color:red\">晓</span><span style=\"color:red\">斌</span>","id":"5b621b78-0240-486d-a48a-5a0383f41988","originalAuthorName":"文晓斌"},{"authorName":"张国君","id":"e710ad03-c3c2-4ae9-9f42-64b462ac2c9e","originalAuthorName":"张国君"},{"authorName":"何家<span style=\"color:red\">文</span>","id":"13262700-415b-4982-aa96-b750a4c6c73d","originalAuthorName":"何家文"}],"doi":"10.3969/j.issn.1009-6264.2005.04.028","fpage":"111","id":"095e2137-4c34-4f51-9281-0f4ae4b70036","issue":"4","journal":{"abbrevTitle":"CLRCLXB","coverImgSrc":"journal/img/cover/CLRCLXB.jpg","id":"15","issnPpub":"1009-6264","publisherId":"CLRCLXB","title":"材料热处理学报"},"keywords":[{"id":"6d836b94-21d2-43c9-afd2-84be863e1ef9","keyword":"氧化","originalKeyword":"氧化"},{"id":"cff29909-22a9-4bd5-b202-eedb7a1563b4","keyword":"磁控溅射","originalKeyword":"磁控溅射"},{"id":"d53bde70-a98f-4f38-b6b3-af0ff08dc0a2","keyword":"梯度镀层","originalKeyword":"梯度镀层"}],"language":"zh","publisherId":"jsrclxb200504028","title":"热氧化温度对磁控溅射CrTiAlN梯度镀层表面形貌与组织结构的影响","volume":"26","year":"2005"},{"abstractinfo":"探讨了微弧氧化溶液体系电导率对陶瓷层生长速度的影响,并以击穿场强作为反映陶瓷层致密度的物理参量,测定了实验条件下电导率与击穿场强的关系.结果表明,陶瓷层的生长速度与溶液电导率之间有近似线性的正比增长关系;而陶瓷层的击穿场强即致密度随电导率的升高呈现先升后降的变化趋势.","authors":[{"authorName":"李均明","id":"ceb57303-95ef-4136-bc36-43eb4c3923c5","originalAuthorName":"李均明"},{"authorName":"蒋百灵","id":"cbbd9892-8541-4f3a-a6cc-c46e1bf882bb","originalAuthorName":"蒋百灵"},{"authorName":"井<span style=\"color:red\">晓</span>天","id":"1f83b7f2-f64d-47a6-be6d-80cb985814a7","originalAuthorName":"井晓天"},{"authorName":"<span style=\"color:red\">文</span><span style=\"color:red\">晓</span><span style=\"color:red\">斌</span>","id":"5c502320-2455-47d7-a0de-f2ab157f676d","originalAuthorName":"文晓斌"}],"doi":"10.3969/j.issn.1009-6264.2003.01.014","fpage":"63","id":"1d6c1f36-9db9-4fd0-ad9f-84511d274891","issue":"1","journal":{"abbrevTitle":"CLRCLXB","coverImgSrc":"journal/img/cover/CLRCLXB.jpg","id":"15","issnPpub":"1009-6264","publisherId":"CLRCLXB","title":"材料热处理学报"},"keywords":[{"id":"2fd2d347-1fd5-4997-a69f-a196cd3521f2","keyword":"微弧氧化","originalKeyword":"微弧氧化"},{"id":"0fef5845-8075-40a9-8812-8fd4f5aebc94","keyword":"溶液电导率","originalKeyword":"溶液电导率"},{"id":"33afc381-4d50-4093-a8b5-5d7abee23565","keyword":"生长速度","originalKeyword":"生长速度"},{"id":"147c6bb4-53cb-41d7-a062-f39fca2444fa","keyword":"致密度","originalKeyword":"致密度"}],"language":"zh","publisherId":"jsrclxb200301014","title":"溶液电导率对LY12铝合金微弧氧化陶瓷层的生长速度和致密度的影响","volume":"24","year":"2003"},{"abstractinfo":"利用非平衡磁控溅射离子镀技术于不同磁控管非平衡度和磁场闭合状态下在单晶硅基体上制备出Cr镀层,采用扫描电子显微镜、X射线衍射仪分析了不同生长阶段Cr镀层的微观形貌、表面粗糙度和晶体择优牛长趋势的变化.结果表明:磁控管非平衡和磁场闭合状态的改变显著影响着Cr镀层生长过程中的结晶取向、表面粗糙度和致密度.不同非平衡度下,Cr镀层组织为疏松的柱状晶体组织,镀层表面粗糙度随磁控管非衡度的增大而增大.随着磁场闭合程度的增加,Cr镀层组织由疏松的柱状晶体组织,向较致密的柱状晶体再向致密的无明显柱状晶体的组织转化,镀层晶体有沿低能量(110)晶面生长向高能量(200)晶面过渡择优生长的趋势.","authors":[{"authorName":"蒋百灵","id":"16e9c815-e768-4b14-a139-364d5c91d3d3","originalAuthorName":"蒋百灵"},{"authorName":"<span style=\"color:red\">文</span><span style=\"color:red\">晓</span><span style=\"color:red\">斌</span>","id":"ae395dc1-aeb8-4a2f-b12e-468e13d43754","originalAuthorName":"文晓斌"},{"authorName":"栾亚","id":"edc4bb27-f383-45a1-8717-1d1fe1031db6","originalAuthorName":"栾亚"},{"authorName":"丁小柯","id":"eedbdec9-cb6a-4fe4-890b-0349747a5425","originalAuthorName":"丁小柯"},{"authorName":"李显","id":"3bd5267c-92f9-4022-a075-f3e55e7765ef","originalAuthorName":"李显"}],"doi":"","fpage":"115","id":"275cd205-afcb-4203-9d57-c1467bb6a2e9","issue":"2","journal":{"abbrevTitle":"CLRCLXB","coverImgSrc":"journal/img/cover/CLRCLXB.jpg","id":"15","issnPpub":"1009-6264","publisherId":"CLRCLXB","title":"材料热处理学报"},"keywords":[{"id":"61b7a58e-6922-49fa-8f6a-384399c6eef2","keyword":"磁控管非平衡度","originalKeyword":"磁控管非平衡度"},{"id":"ee0591b5-3ee8-4f29-af57-ae622184394b","keyword":"闭合状态","originalKeyword":"闭合状态"},{"id":"8290436f-7da1-4d2e-86a2-fc4cdaa08280","keyword":"磁控溅射离子镀","originalKeyword":"磁控溅射离子镀"},{"id":"3fb86709-b431-41dd-8699-f47ee81e973d","keyword":"粗糙度","originalKeyword":"粗糙度"},{"id":"b4705fa1-59f0-41cf-9ed8-48586d66d0be","keyword":"择优取向","originalKeyword":"择优取向"}],"language":"zh","publisherId":"jsrclxb200902029","title":"非平衡度和闭合状态对磁控溅射离子镀过程的影响","volume":"30","year":"2009"},{"abstractinfo":"采用直流磁控溅射方法于不同磁控管非平衡度状态下,通过单靶溅射模式在单晶si衬底上制备了Cr膜.利用AFM、SEM、四探针测试仪及MTS Nano Indenter XP纳米压入测量仪分别对两种磁控管非平衡状态下所得Cr膜的微观形貌、电阻率、纳米硬度和抗磨损性进行了观察和分析,研究了不同磁控管非平衡状态下Cr膜微观结构与性能之间的关系.结果表明:磁控管非平衡状态显著影响着Cr膜的微观结构及性能.不同非平衡度状态下,镀层晶体均为沿Cr(110)择优生长的柱状晶组织.同一靶基距处,镀层晶粒尺寸及硬度与非平衡度大小成正比,而电阻率及抗磨损性能变化趋势却相反.靶基距亦为影响镀层微观结构和性能的重要因素之一.","authors":[{"authorName":"<span style=\"color:red\">文</span><span style=\"color:red\">晓</span><span style=\"color:red\">斌</span>","id":"99730f1b-0680-427d-a13c-6d09dd97577f","originalAuthorName":"文晓斌"},{"authorName":"李显","id":"1a3e7121-498d-41bc-b0c6-b3977601309e","originalAuthorName":"李显"},{"authorName":"梁戈","id":"7b571c9a-54c9-45ae-833f-dac703b10663","originalAuthorName":"梁戈"},{"authorName":"蒋百灵","id":"a0198cdb-75a9-44c4-a525-24437cd40d2f","originalAuthorName":"蒋百灵"}],"doi":"","fpage":"100","id":"3a8ff550-a69c-48f3-96d0-50c5bec31a9f","issue":"10","journal":{"abbrevTitle":"CLRCLXB","coverImgSrc":"journal/img/cover/CLRCLXB.jpg","id":"15","issnPpub":"1009-6264","publisherId":"CLRCLXB","title":"材料热处理学报"},"keywords":[{"id":"f4a5dbbd-4f95-4da2-8598-634c67672fb5","keyword":"磁控管非平衡度","originalKeyword":"磁控管非平衡度"},{"id":"7eb1ae2b-c2cd-41ed-88e8-c2c50fee46b8","keyword":"微观形貌","originalKeyword":"微观形貌"},{"id":"39771b56-1ab3-427b-9a79-29fd045cc9e1","keyword":"纳米硬度","originalKeyword":"纳米硬度"},{"id":"a7ab6a82-7924-4379-96b8-c73fdc59df39","keyword":"抗磨损性","originalKeyword":"抗磨损性"}],"language":"zh","publisherId":"jsrclxb201010020","title":"磁控管非平衡状态对Cr膜微观形貌及性能的影响","volume":"31","year":"2010"},{"abstractinfo":"碳/碳复合材料既有良好的生物相容性,又有良好的力学性能,是一种极具潜力的新型生物材料.为提高其硬度、耐磨性,降低摩擦系数,需对其表面进行处理.本研究先利用包埋法在其表面制备SiC涂层,后利用非平衡磁控溅射技术在SiC涂层表面制备了掺铬碳膜.通过XRD,Raman,SEM,EDAX和XPS对其结构和形貌进行了表征,用MM-200型环块磨损试验机对膜的摩擦学性能进行了测定.研究结果表明:掺铬碳膜在XRD及拉曼光谱上都没有明显的峰,为非晶态结构.碳原子主要为类石墨碳.非晶态掺铬碳膜的摩擦系数约为0.100,比碳/碳复合材料低;磨损率为0.45×10-6mm3·(Nm)-1,也比碳/碳复合材料低.","authors":[{"authorName":"胡志彪","id":"9fd3cd3f-72b6-4bb6-8ec1-e885db692bc7","originalAuthorName":"胡志彪"},{"authorName":"李贺军","id":"51955faf-30ca-4fcc-a568-31e3c322a234","originalAuthorName":"李贺军"},{"authorName":"<span style=\"color:red\">文</span><span style=\"color:red\">晓</span><span style=\"color:red\">斌</span>","id":"c9822c01-50b9-426d-b860-a08a108b3afd","originalAuthorName":"文晓斌"},{"authorName":"傅前刚","id":"ba0cf399-99e4-4c3e-853f-dab2efc203d4","originalAuthorName":"傅前刚"},{"authorName":"李克智","id":"9ec5148c-9f6f-4b7a-8e81-da578599df54","originalAuthorName":"李克智"}],"doi":"","fpage":"1204","id":"4073461d-4fd8-466a-bf4d-a7985cf73d18","issue":"8","journal":{"abbrevTitle":"XYJSCLYGC","coverImgSrc":"journal/img/cover/XYJSCLYGC.jpg","id":"69","issnPpub":"1002-185X","publisherId":"XYJSCLYGC","title":"稀有金属材料与工程"},"keywords":[{"id":"ea4b90fe-9c63-44f2-aa99-8cfb80a0347c","keyword":"碳/碳复合材料","originalKeyword":"碳/碳复合材料"},{"id":"10c2a6ab-d146-4595-9a37-8d3b69645487","keyword":"非晶态碳膜","originalKeyword":"非晶态碳膜"},{"id":"114c31dc-7b4c-412e-940b-b5b8f5b902b1","keyword":"生物材料","originalKeyword":"生物材料"}],"language":"zh","publisherId":"xyjsclygc200608007","title":"碳化硅-碳/碳复合材料表面掺铬碳膜的研究","volume":"35","year":"2006"},{"abstractinfo":"利用非平衡磁控溅射仪在碳/碳复合材料表面制备了MoS2-Ti复合膜.采用XRD,Raman光谱、X射线光电子能谱仪对其结构进行了表征,并利用X射线光电子能谱仪对复合膜的抗氧化性能进行了研究.研究结果表明:所制备的MoS2-Ti复合膜为非晶态结构;MoS2-Ti复合膜具有良好的抗氧化性能,将其在蒸馏水中浸泡200 h后,Mo4+没有被氧化.","authors":[{"authorName":"胡志彪","id":"9c4546f3-ad2c-44dc-8447-a6f4b5a9fa6d","originalAuthorName":"胡志彪"},{"authorName":"李贺军","id":"00f691b0-e8a5-421a-a14c-7ca15dcc47b4","originalAuthorName":"李贺军"},{"authorName":"付前刚","id":"bdcf596a-0097-47a3-9925-acf81f5c544b","originalAuthorName":"付前刚"},{"authorName":"<span style=\"color:red\">文</span><span style=\"color:red\">晓</span><span style=\"color:red\">斌</span>","id":"0d0cf4ee-561c-4188-94ee-98663b245bd8","originalAuthorName":"文晓斌"},{"authorName":"孙国岭","id":"1d284b7c-628a-4fe9-9d2e-75a193499b44","originalAuthorName":"孙国岭"},{"authorName":"黄凤萍","id":"c84b6549-ae15-4027-886c-ba1e11ac018b","originalAuthorName":"黄凤萍"}],"doi":"","fpage":"216","id":"5c1548e3-edc7-4c03-8df5-869cddf04c7d","issue":"z2","journal":{"abbrevTitle":"XYJSCLYGC","coverImgSrc":"journal/img/cover/XYJSCLYGC.jpg","id":"69","issnPpub":"1002-185X","publisherId":"XYJSCLYGC","title":"稀有金属材料与工程"},"keywords":[{"id":"8691ef25-a8ad-4e54-86c4-5eca64ced45e","keyword":"碳/碳复合材料","originalKeyword":"碳/碳复合材料"},{"id":"9399ab24-633f-4ef6-b274-990eb9c4110f","keyword":"MoS2-Ti复合膜","originalKeyword":"MoS2-Ti复合膜"},{"id":"7809ec7e-90b4-4813-b35d-927a835ee7a1","keyword":"抗氧化性能","originalKeyword":"抗氧化性能"}],"language":"zh","publisherId":"xyjsclygc2006z2054","title":"MoS2-Ti复合膜的结构及其抗氧化性能","volume":"35","year":"2006"},{"abstractinfo":"利用非平衡磁控溅射仪在碳/碳复合材料表面制备了MoS2-Ti复合膜.采用XRD,Raman光谱、X射线光电子能谱仪对其结构进行了表征,并利用X射线光电子能谱仪对复合膜的抗氧化性能进行了研究.研究结果表明:所制备的MoS2-Ti复合膜为非晶态结构;MoS2-Ti复合膜具有良好的抗氧化性能,将其在蒸馏水中浸泡200 h后,Mo4+没有被氧化.","authors":[{"authorName":"胡志彪","id":"91bbbd5e-e80b-4660-8910-0518b8b182c5","originalAuthorName":"胡志彪"},{"authorName":"李贺军","id":"667683fb-f5ca-47d7-ac8e-fd91c90b06b4","originalAuthorName":"李贺军"},{"authorName":"付前刚","id":"e4fbc884-c95a-4d3e-9800-4778dac8aa3b","originalAuthorName":"付前刚"},{"authorName":"<span style=\"color:red\">文</span><span style=\"color:red\">晓</span><span style=\"color:red\">斌</span>","id":"93856472-ff76-4904-8459-3491c58d2ae0","originalAuthorName":"文晓斌"},{"authorName":"孙国岭","id":"1bcfa37e-388c-4ffa-89de-6444bb7f893a","originalAuthorName":"孙国岭"},{"authorName":"黄凤萍","id":"ad74b705-15e1-4ef5-8739-8b17242a68da","originalAuthorName":"黄凤萍"}],"doi":"","fpage":"216","id":"a2a204a9-e18a-40b9-b0f6-e2c189b38b3c","issue":"z1","journal":{"abbrevTitle":"XYJSCLYGC","coverImgSrc":"journal/img/cover/XYJSCLYGC.jpg","id":"69","issnPpub":"1002-185X","publisherId":"XYJSCLYGC","title":"稀有金属材料与工程"},"keywords":[{"id":"48c9c064-2fb6-4c12-a7ac-3e8f03c6bfe4","keyword":"碳/碳复合材料","originalKeyword":"碳/碳复合材料"},{"id":"acffb058-e3b7-448f-a101-0a35df73285a","keyword":"MoS2-Ti复合膜","originalKeyword":"MoS2-Ti复合膜"},{"id":"08c9e973-53eb-4635-8b7b-402f290d08c3","keyword":"抗氧化性能","originalKeyword":"抗氧化性能"}],"language":"zh","publisherId":"xyjsclygc2006z1054","title":"MoS2-Ti复合膜的结构及其抗氧化性能","volume":"35","year":"2006"},{"abstractinfo":"采用扫描电子显微镜、表面粗糙度测试仪及X射线衍射仪分析了直流、单靶磁控溅射条件下磁控管非平衡度对Cr镀层生长过程的影响.结果表明:磁控管非平衡度的改变显著影响着整个沉积过程中镀层的表面形貌、表面粗糙度以及镀层晶体结构.镀层沉积各时间段内均由不同的影响因素主导其生长过程,斜向沉积和自遮蔽效应是柱状晶斜向生长的主要原因.同一沉积时间下,镀层粗糙度随磁控管非衡度的增大而增大.随着沉积速率的增大,镀层晶体经历了由随机生长向择优生长的转变过程且镀层晶体发生了由密排面Cr(110)向次密排面Cr(200)择优生长的转变.","authors":[{"authorName":"<span style=\"color:red\">文</span><span style=\"color:red\">晓</span><span style=\"color:red\">斌</span>","id":"b1b2165d-1b34-486b-a3c7-85f48db24c86","originalAuthorName":"文晓斌"},{"authorName":"李显","id":"0f11c274-9ca5-4735-9974-b69e851313a0","originalAuthorName":"李显"},{"authorName":"梁戈","id":"18e56126-793f-4ac7-9715-2baa8ab998ca","originalAuthorName":"梁戈"},{"authorName":"蒋百灵","id":"1b4d7174-ac4c-4ca5-bedd-9b9ffdffefa3","originalAuthorName":"蒋百灵"}],"doi":"","fpage":"693","id":"c3a3854c-ff9e-42b3-be20-c543011daf4d","issue":"3","journal":{"abbrevTitle":"RGJTXB","coverImgSrc":"journal/img/cover/RGJTXB.jpg","id":"57","issnPpub":"1000-985X","publisherId":"RGJTXB","title":"人工晶体学报"},"keywords":[{"id":"103309f3-b636-4585-8457-42afbb57ab8a","keyword":"磁控管非平衡度","originalKeyword":"磁控管非平衡度"},{"id":"9ef25868-499e-46cc-bdf3-1f8d6b6e3782","keyword":"表面形貌","originalKeyword":"表面形貌"},{"id":"ca66fbec-229a-402d-ae0b-5783a8fe9727","keyword":"粗糙度","originalKeyword":"粗糙度"},{"id":"56db68f4-e28d-4856-9ce8-4b1caefdea5e","keyword":"晶体结构","originalKeyword":"晶体结构"}],"language":"zh","publisherId":"rgjtxb98200903033","title":"磁场非平衡度对Cr镀层晶体生长过程的影响","volume":"38","year":"2009"},{"abstractinfo":"分析了CrTiAlN镀层的组织,研究了CrTiAlN镀层对M2高速钢刀具切削性能的影响.结果表明:CrTiAlN镀层提高了M2基高速钢刀具的切削性能.CrTiAlN镀层具有良好的高温稳定性能,能避免红硬性不足引起的刀具失效;CrTiAlN镀层与M2基体的结合较强,具有稳定结构,能避免抗压强度下降引起的刀具失效.","authors":[{"authorName":"白力静","id":"a66d30ed-3c9f-47e4-97c8-fe977c9df1f3","originalAuthorName":"白力静"},{"authorName":"蒋百灵","id":"da79a61b-d86f-4795-b719-eee6988494e3","originalAuthorName":"蒋百灵"},{"authorName":"肖继明","id":"6bbb5a73-7395-4667-989c-8f3c287325e9","originalAuthorName":"肖继明"},{"authorName":"<span style=\"color:red\">文</span><span style=\"color:red\">晓</span><span style=\"color:red\">斌</span>","id":"801392b5-8d6c-4393-910b-ca3cb2466e71","originalAuthorName":"文晓斌"},{"authorName":"李玉庆","id":"01f5bec3-fb86-49da-b596-c19e82851a8e","originalAuthorName":"李玉庆"}],"doi":"10.3321/j.issn:1005-3093.2006.01.012","fpage":"54","id":"f796a598-85b4-4131-a1b7-be4f3727f6f9","issue":"1","journal":{"abbrevTitle":"CLYJXB","coverImgSrc":"journal/img/cover/CLYJXB.jpg","id":"16","issnPpub":"1005-3093","publisherId":"CLYJXB","title":"材料研究学报"},"keywords":[{"id":"254f0c9b-ef5f-414f-8ca6-129a3626ded8","keyword":"材料表面与界面","originalKeyword":"材料表面与界面"},{"id":"8eb2def1-fe93-4ddb-8462-ad1a2a368ade","keyword":"CrTiAlN镀层","originalKeyword":"CrTiAlN镀层"},{"id":"bd162899-f3b1-4ba1-8a6b-aa5a2ff183bb","keyword":"切削性能","originalKeyword":"切削性能"},{"id":"2301a0e4-2b4c-48ec-85db-944f3e3e2798","keyword":"热稳定性","originalKeyword":"热稳定性"}],"language":"zh","publisherId":"clyjxb200601012","title":"CrTiAlN镀层对M2基高速钢切削性能的影响","volume":"20","year":"2006"},{"abstractinfo":"本刊2012年第五期第801页刊登了熊<span style=\"color:red\">晓</span>英等作者的论文,这是本刊编辑部自创刊以来收到的第一篇这样的论文,该文对本刊在材料科学期刊中所处的地位及面临问题、发展方向作出如此客观、中肯的评价与指引,均使编辑部成员十分感动。今年恰是本刊创刊30周年纪念,谨以此《编后记》供奉广大读者,","authors":[{"authorName":"无","id":"6eb4c714-a474-4cd0-b393-f0306b138318","originalAuthorName":"无"}],"doi":"","fpage":"714","id":"70565a37-1b6d-4b46-9b09-eb71030a22e8","issue":"5","journal":{"abbrevTitle":"CLKXYGCXB","coverImgSrc":"journal/img/cover/CLKXYGCXB.jpg","id":"13","issnPpub":"1673-2812","publisherId":"CLKXYGCXB","title":"材料科学与工程学报"},"keywords":[{"id":"b4b988f9-967f-4530-817f-d29f1623cfa2","keyword":"科学评价","originalKeyword":"科学评价"},{"id":"614f8cc5-6336-4065-b303-26b67f81d1be","keyword":"论文","originalKeyword":"论文"},{"id":"bf3cdaa0-4927-4d1a-a122-779ead854c34","keyword":"作者","originalKeyword":"作者"},{"id":"54d5797b-6f47-4f76-9527-3b32105f0299","keyword":"务实","originalKeyword":"务实"},{"id":"2124d564-90da-4a58-85da-22654e0d5dd2","keyword":"科学期刊","originalKeyword":"科学期刊"},{"id":"1dee1687-be42-4d28-aed7-6cd29a5c6883","keyword":"编辑部","originalKeyword":"编辑部"},{"id":"b28e651a-8495-4eba-87c6-79d47b81d924","keyword":"创刊","originalKeyword":"创刊"}],"language":"zh","publisherId":"clkxygc201205014","title":"科学评价,务实求真——熊<span style=\"color:red\">晓</span>英等作者的论文编后记","volume":"30","year":"2012"}],"totalpage":17,"totalrecord":163}