材料期刊网

反应溅射非晶态氧化铝薄膜

楼翰一 , 朱圣龙 , 王福会 , 吴维(?)

金属学报

研究了平面磁控直流反应溅射法沉积氧化铝薄膜的过程。结果表明氧分压大小对反应溅射过程有决定性作用,当氧分压增大或减小过程中存在两个阈值。氧分压小于阈值为金属Al溅射区,大于阈值为氧化铝溅射区。在阈值附近总气压、溅射电压和沉积速率发生突变,溅射特性(V-J)曲线有不同规律。沉积的氧化铝膜为非晶态,高温下可晶化,本文还讨论了反应溅射的机理。

关键词: 氧化铝膜 , amorphous film , reactive sputtering

IN SITU TEM OBSERVATION OF AMORPHOUS Nd_xFe_(1-x)THIN FILMS AND THEIR CRYSTALLIZATION

L(?) Manqi State Key Laboratory of Rapidly Solidified and Non-Equilibrium Alloys , International Centre for Meterials Physics , Institute of Metal Research , Academia Sinica , Shenyang , ChinaWAGENDRISTEL A Iastitut fur Anwend Physik , Technische Universitat in Wien , Austria associate professor , Institute of Metal Research , Academia Sinica , Shenyang 110015 , China

金属学报(英文版)

The room temperature stability and crystallization of amorphous Nd_xFe_(1-x)thin films with x=0.06—0.90,prepared by flash evaporation at 77 K,were investigated by X-ray diffraction and TEM observation.The amorphous Nd_xFe_(1-x)films are stable at room temperature when 0.19

关键词: amorphous film , null , null

CORROSION BEHAVIOR OF Cu-Nb AND Ni-Nb AMORPHOUS FILMSPREPARED BY ION BEAM ASSISTED DEPOSITION

B.Zhao , F.Zeng , D.M.Li , F.Pan

金属学报(英文版)

The Cu25Nb75 and Ni45Nb55 amorphous films with about 50Onm thickness were pre-pared by ion beam assisted deposition (IBAD). Potentiodynamic polarization measure-ment was adopted to investigate the corrosion resistance of samples and the tests were carried out respectively in 1mol/L H2SO4 and NaOH aquatic solution. The corrosion performance of the amorphous films was compared with that of multilayered and pure Nb films. Experimental results indicated that the corrosion resistance of amorphous films was better than that of the corresponding multilayers and pure Nb films for both Ni-Nb system with negative heat of formation and Cu-Nb system with positive heat of formation.

关键词: amorphous film , null , null

CORROSION BEHAVIOR OF Cu-Nb AND Ni-Nb AMORPHOUS FILMS PREPARED BY ION BEAM ASSISTED DEPOSITION

金属学报(英文版)

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