孙东升
,
李凤照
,
戴吉岩
,
李斗星
金属学报
采用高分辨电子显微镜研究了离子渗氮层的晶体缺陷和界面结构结果表明,高速离子的持续轰击将导致大量空位点缺陷的产生,空位的聚合形成空位盘,空位盘的崩塌形成扩展位错,层错四面体等晶体缺陷 ε(Fe_(2-3)N)和γ'(Fe_4N)相界面平直、共格,且具有:(111)∥(0001)_ε,[110]γ'∥[1120]_ε的取向关系
关键词:
晶体缺陷
,
interface structure
,
ion-nitriding
SUN Dongsheng LI Fengzhao Shandong Polytechnic University
,
Jinan
,
Laboratory of Atomic Imaging of Solids
,
Institute of Metal Research
,
Academia Sinica
,
Shenyang
,
ChinaDAI Jiyan LI Douxing Laboratory of Atomic Imaging of Solids
,
Institute of Metal Research
,
Academia Sinica
,
Shenyang
,
China associate professor
,
Institute of Materials Engineering
,
Shandong Polytechnic University
,
Jinan 250014
,
China
金属学报(英文版)
Observation under high resolution electron microscope shows that the continuous bombing of high speed ions produces a great amount of vacant site defects.The assembly of vacancies forms vacant dish,and the collapase of vacant dish forms stacking fault tetrahedrons and oth- er crystal defects.The interfaces between phase ε(Fe_(2-3)N)and phase γ'(Fe_4N)are smooth, straight and coherent,and they have the orientation relationships of(11)//(0001)and [110]/[110] .
关键词:
crystal defect
,
null
,
null
,
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