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Composition and Microstructure of Magnetron Sputtering Deposited Ti-containing Amorphous Carbon Films

Jun DU , Ping ZHANG

材料科学技术(英)

Ti-containing carbon films were deposited by using magnetron sputtering deposition. The composition and microstructure of the carbon films were characterized in detail by combining the techniques of Rutherford backscattering spectrometry (RBS), X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD) and transmission electron microscopy (TEM). It is found that carbon films contain Ti 18 at pct; after Ti incorporation, the films consist of titanium carbide; C1s peak appears at 283.4 eV and it could be divided into 283.29 and 284.55 eV, representing sp2 and sp3, respectively, and sp2 is superior to sp3. This Ti-containing film with dominating sp2 bonds is nanocomposites with nanocrystalline TiC clusters embedded in an amorphous carbon matrix, which could be proved by XRD and TEM.

关键词: magnetic sputter deposition , 磁控溅射 , 碳膜

Effects of Substrate Temperature on the Properties of Mo-doped ZnO Films Prepared by RF Magnetron Sputtering

Xianwu Xiu

材料科学技术(英)

Transparent conducting molybdenum-doped zinc oxide (MZO) films were successfully prepared by radio frequency (RF) magnetron sputtering method on glass substrates under different substrate temperatures. The nature of MZO film is polycrystalline with hexagonal structure and a preferred orientation along c-axis. With increasing substrate temperature from room temperature to 400°C, the crystallinity of the films is deteriorated and the resistivity increases sharply due to both the decrease of carrier concentration and Hall mobility. The lowest resistivity achieved is 9.2×10-4 ­Ω· cm with a high Hall mobility of 30 cm2·V-1·s-1 for the film deposited at room temperature. The average transmittance in the visible range exceeds 85% for all the samples. The optical band gap decreases from 3.30 to 3.25 eV with substrate temperature from room temperature to 400°C.

关键词: Zinc oxide , , 衬底温度 , 磁控溅射

闭合场非平衡磁控溅射离子CrAlTiN镀层在PCB用微钻中的应用

种艳琳 , 蒋白灵 , 白力静

表面技术 doi:10.3969/j.issn.1001-3660.2006.02.026

采用闭合场非平衡磁控溅射离子镀技术在PCB微钻上进行复合金属镀层处理,通过与无镀层微钻进行钻削试验对比,结果表明:CrAlTiN镀层微钻使用寿命与无镀层微钻相比,寿命可提高3倍;具有纳米结构的高硬度镀层显著提高了微钻的耐磨性.

关键词: 闭合场 , 非平衡 , 磁控溅射 , 离子镀 , CrAlTiN镀层 , PCB微钻 , 寿命 , 耐磨性

挠性印制线路板孔金属化研究

余凤斌 , 冯立明 , 夏祥华 , 耿秋菊

电镀与涂饰

结合偏压磁控溅射铜(铜靶,本底真空度6.6 mPa,工作压力0.4 Pa,电流0.3 A,电压450 V,负偏压50 V,溅射时间10min)及脉冲焦磷酸盐电镀铜(60~70 g/L焦磷酸铜,280~320 g/L,焦磷酸钾,20~25 g/L柠檬酸铵,温度45~50℃,pH4.2~4.5)工艺对以聚酰亚胺薄膜为基材的挠性印制线路板微孔进行金属化处理,讨论了正向脉冲平均电流密度对镀层质量,以及正向脉冲占空比对镀层金相显微组织和电阻的影响.结果表明:金属化后孔壁镀层连续,平整光滑,结合力较好;随着正向脉冲电流密度的增大,镀层粗糙度减小;随着正向脉冲占空比的增大,镀层电阻急剧增大并最终达到稳定状态.

关键词: 聚酰亚胺 , 挠性印制线路板 , 孔金属化 , 脉冲电镀 , 磁控溅射 , 占空比 , 形貌 , 电阻

膜厚对(Ti,Al)N涂层微结构、机械性能及切削特性的影响

苏永要 , 胡荣 , 王锦标 , 冯桐 , 鲜济遥

电镀与涂饰

利用蒸发与磁控溅射二元组合源设备,通过控制沉积时间在钨钴类硬质合金螺纹刀表面制备了不同膜厚的(Ti,Al)N涂层.采用X射线衍射仪、扫描电镜、能谱仪、维氏显微硬度计、洛氏硬度计和摩擦试验机考察了涂层厚度对涂层微观结构、表面形貌、元素组成、显微硬度、膜-基结合力及摩擦磨损性能的影响,并通过切削40Cr钢材研究了涂层刀具的切削特性.结果表明,沉积6h所得涂层(膜厚约5.0 μm)的复合硬度(涂层+基材的显微硬度)显著高于沉积2h(膜厚约1.8 μm)所得涂层,但膜-基结合力更弱,磨耗速率更快.

关键词: 氮化钛铝 , 涂层 , 钨钴类硬质合金 , 刀具 , 厚度 , 磁控溅射 , 真空镀 , 摩擦学

柔性硬质纳米复合涂层

金德里奇·缪塞尔 , 吉小超

中国表面工程 doi:10.11933/j.issn.1007-9289.2016.03.001

研究了利用磁控溅射方法制备的柔性硬质纳米复合涂层.结果表明柔性硬质纳米复合涂层具有以下优异性能:是一类具有高硬度、高韧性以及抗裂纹性能的新型涂层;具有较高的硬度模量比(H/E*≥0.1,E*=E/(1-v2))、弹性恢复系数(We≥60%)、压应力(σ<0)L,且少缺陷的微观结构;生长处于Thornton结构区域相图的T区.磁控溅射非常适合制备纳米复合涂层,文中将对其制备柔性纳米复合薄膜的机理做深入阐述.涂层生长主要受以下3个参数影响:涂层生长过程中吸收的能量Ep,其包含沉积原子携带的能量Eca和轰击离子携带等能量Ebi(Ep=Eca+Ebi),基体温度Ts和涂层材料的熔点Tm.柔性硬质涂层具有广泛的应用前景,如柔性保护涂层、柔性功能涂层、防脆性涂层开裂的柔性保护涂层以及柔性多层涂层.文中还将详细阐述低温磁控溅射制备柔性纳米复合涂层的原理,并阐述纳米复合涂层及其性能的发展趋势.

关键词: 硬质纳米复合涂层 , 微观结构 , 宏观应力 , 力学性能 , 能量 , 柔性 , 裂纹抑制 , 磁控溅射

Nanoscale Multilayered ZrAlN/ZrB2 Coatings Synthesized by Magnetron Sputtering

Dejun LI

材料科学技术(英)

Multilayered ZrAlN/ZrB2 coatings containing alternating bilayer periods were synthesized by dc magnetron sputtering technique. The intensities of ZrN (111) or ZrN (200) textures in the structure of the nanolayers depended on the bilayer period as well as N2 gas partial pressure during deposition. Nanoindentation testing showed that hardness and internal stress of the nanolayers varied with the bilayer period and crystallographic orientation in the coatings. The hardness of the nanolayers with bilayer periods of 3~6 nm was enhanced (~27%) over the rule-of-mixture value. A low percent of N2 in processing gas was proved to be benefitial to the synthesis of high hard nanoscale multilayered coatings.

关键词: Nanoscale multiplayer , 超晶格 , 磁控溅射

抗菌镀银纤维的制备及其性能

余凤斌 , 陈莹

电镀与涂饰

为了使涤纶织物具有抗菌性,采用磁控溅射方法在涤纶纤维表面制备了镀银层.采用扫描电镜观察了镀银纤维的表面和截面形貌,测试了含镀银纤维的织物的抗菌性及耐洗涤性.结果表明,染整工艺会降低织物的含银量,但对其抗菌性影响不大.织物的抗菌性随镀银纤维含量的增加而增强,含4%镀银纤维的织物即可具有优异的抗菌性.未经洗涤的镀银纤维织物对大肠杆菌、金黄色葡萄球菌和白色念珠菌的抗菌率均达99%以上,经过20次洗涤之后的抑菌率仍达95%以上,但经50次水洗后的抑菌率分别为降到97%、73%和72%.

关键词: 涤纶纤维 , 镀银 , 磁控溅射 , 织物 , 形貌 , 抗菌性 , 耐洗涤性

铝箔电镀铜和锡的工艺

曾海军

电镀与涂饰

对铝箔表面进行等离子体清洗并磁控溅射镍铜合金中间层后再电镀,得到了致密、结合力好的铜、锡电镀层.讨论了等离子清洗时的电压、磁控溅射时的负偏压及中间层的合金组成对后续镀层结合力的影响.指出了电镀铜时的电源波形及电镀锡时的温度对镀层性能的影响.采用该工艺制备的覆铜铝箔,其成本仅为普通铜箔的1/4,弱酸性镀锡后镀层的可焊性良好.

关键词: 铝箔 , 等离子清洗 , 磁控溅射 , , , 电镀 , 结合力

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